SCHEMBL182089

SCHEMBL182089

CC1[CH]C1.[CH2]CCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL16617782 0.75
SCHEMBL38170 0.75
SCHEMBL16617206 0.75
SCHEMBL958930 0.71 TSHR (0.36)
SCHEMBL221 0.71
SCHEMBL453616 0.71
SCHEMBL28253342 0.69
SCHEMBL4352737 0.68
SCHEMBL7732310 0.68
Cyclohexane SCHEMBL28165545 0.68 CYP1A2 (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 285 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112047693-A RPC cover plate for road and preparation method thereof 江西龙正科技发展有限公司 2020-12-08 CN claimed
CN-112029176-A Special material suitable for producing inner-rib reinforced polyethylene corrugated pipe and preparation thereof 江西龙正科技发展有限公司 2020-12-04 CN claimed
EP-0410654-B1 Light- sensitive composition FUJI PHOTO FILM CO LTD (JP) 1998-10-28 EP claimed
US-5141995-A Melting, kneading and Blending with polyol fatty acid, phenolic antioxidant, radical generating agent CHISSO CORPORATION (JP) 1992-08-25 US claimed
US-5064747-A Improved photosensitivity using an unsaturated 1,3-dithiol-2-ylidene derivative; lithographic printing plates; photoresists FUJI PHOTO FILM CO., LTD. (JP) 1991-11-12 US claimed
EP-0410654-A2 Light- sensitive composition FUJI PHOTO FILM CO., LTD. (JP) 1991-01-30 EP claimed
WO-2024135443-A1 PHOTOELECTRIC CONVERSION ELEMENT, IMAGING ELEMENT, OPTICAL SENSOR, AND COMPOUND 富士フイルム株式会社 2024-06-27 WO disclosed
WO-2024122301-A1 PHOTOELECTRIC CONVERSION ELEMENT, IMAGING DEVICE, PHOTOSENSOR, METHOD FOR PRODUCING IMAGING DEVICE, AND COMPOUND 富士フイルム株式会社 2024-06-13 WO disclosed
WO-2024071143-A1 PHOTOELECTRIC CONVERSION ELEMENT, IMAGING ELEMENT, LIGHT SENSOR, COMPOUND, AND COMPOUND PRODUCTION METHOD 富士フイルム株式会社 2024-04-04 WO disclosed
WO-2024071188-A1 PHOTOELECTRIC CONVERSION ELEMENT, IMAGING ELEMENT, LIGHT SENSOR, AND COMPOUND 富士フイルム株式会社 2024-04-04 WO disclosed
EP-3823054-B1 PHOTOELECTRIC CONVERSION ELEMENT, IMAGING ELEMENT, OPTICAL SENSOR, AND COMPOUND FUJIFILM CORP (JP) 2024-02-14 EP disclosed
US-20240043674-A1 RUBBER COMPOSITION FOR HOT AIR CROSS-LINKING, CROSS-LINKED RUBBER, AND PRODUCTION METHOD OF CROSS-LINKED RUBBER NOF CORPORATION (JP) 2024-02-08 US disclosed
EP-4306526-A2 COMPOUND FOR PHOTOELECTRIC CONVERSION ELEMENT FUJIFILM Corporation (JP) 2024-01-17 EP disclosed
US-5061605-A IMPROVED SENSITIVITY TO LONG WAVELENGTHS FUJI PHOTO FILM CO., LTD. (JP) 1991-10-29 US disclosed
EP-0410654-A2 Light- sensitive composition FUJI PHOTO FILM CO., LTD. (JP) 1991-01-30 EP disclosed
US-4960771-A TRANSDERMAL DELIVERY OF THERAPEUTIC AGENTS; DRUGS, SUNSCREENS, INSECT REPELLENTS, COSMETICS LVMH MOET HENNESSY LOUIS VUITTON, INC. 1990-10-02 US disclosed
EP-0378657-A1 OXAZOLIDINONE PENETRATION ENHANCING COMPOUNDS. RAJADHYAKSHA VITHAL J 1990-07-25 EP disclosed
WO-1990000407-A1 OXAZOLIDINONE PENETRATION ENHANCING COMPOUNDS RAJADHYAKSHA VITHAL J (US) 1990-01-25 WO disclosed
EP-0341720-A2 Light-sensitive compositions Fuji Photo Film Co., Ltd. (JP) 1989-11-15 EP disclosed
US-4810618-A HIGH SENSITIVITY, PRINTING PLATES, PHOTORESISTS FUJI PHOTO FILM CO., LTD. (JP) 1989-03-07 US disclosed