⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1818889 | 0.84 | — | — | |
| SCHEMBL16544543 | 0.76 | — | — | |
| SCHEMBL1820462 | 0.73 | — | — | |
| SCHEMBL12157334 | 0.71 | — | — | |
| SCHEMBL16549436 | 0.69 | — | — | |
| SCHEMBL17904713 | 0.67 | — | — | |
| SCHEMBL443045 | 0.66 | — | — | |
| SCHEMBL23646051 | 0.64 | — | — | |
| SCHEMBL1766968 | 0.64 | — | — | |
| SCHEMBL12593985 | 0.63 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2317543-A2 | Gas for plasma reaction, process for producing the same and use | Zeon Corporation (JP) | 2011-05-04 | — | — | EP | disclosed |
| US-7652179-B2 | Gas for plasma reaction, process for producing the same, and use thereof | ZEON CORPORATION (JP) | 2010-01-26 | — | — | US | disclosed |
| US-20080139855-A1 | Gas for plasma reaction, process for producing the same, and use thereof | ZEON CORPORATION (JP) | 2008-06-12 | — | — | US | disclosed |
| US-7341764-B2 | Chemical vapor deposition using compound such as perfluoro-2-pentyne gas for plasma reaction to form fluorocarbon thin film, semiconductors | ZEON CORPORATION (JP) | 2008-03-11 | — | — | US | disclosed |
| US-20050247670-A1 | Method of dry etching, dry etching gas and process for producing perfluoro-2-pentyne | ZEON CORPORATION (JP) | 2005-11-10 | — | — | US | disclosed |
| CN-1669129-A | Dry etching method, dry etching gas, and method for producing perfluoro-2-pentyne | ZEON CORP (JP) | 2005-09-14 | — | — | CN | disclosed |
| EP-1542268-A1 | METHOD OF DRY ETCHING, DRY ETCHING GAS AND PROCESS FOR PRODUCING PERFLUORO-2-PENTYNE | Zeon Corporation (JP) | 2005-06-15 | — | — | EP | disclosed |
| US-20050092240-A1 | Gas for plasma reaction, process for producing the same, and use | ZEON CORPORATION (JP) | 2005-05-05 | — | — | US | disclosed |
| EP-1453082-A1 | GAS FOR PLASMA REACTION&comma; PROCESS FOR PRODUCING THE SAME&comma; AND USE | Zeon Corporation (JP) | 2004-09-01 | — | — | EP | disclosed |