SCHEMBL18240485

SCHEMBL18240485

C=[Zr](C1=CC=CC1)(c1c2c(cc(C(C)(C)C)c1-c1ccccc1)-c1cc(C(C)(C)C)c(-c3ccccc3)cc1C2)C(C)(C)c1ccccc1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL18092780 0.99
SCHEMBL4953060 0.85
Hydrochloric Acid SCHEMBL18092783 0.81
Hydrochloric Acid SCHEMBL27153410 0.81
SCHEMBL4956009 0.81
SCHEMBL4949914 0.81
SCHEMBL18142175 0.81
Hydrochloric Acid SCHEMBL18092777 0.80
Hydrochloric Acid SCHEMBL6047494 0.80
SCHEMBL18142160 0.79

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11492471-B2 Polypropylene resin composition and monolayer and multilayer film MITSUI CHEMICALS, INC. (JP) 2022-11-08 US disclosed
US-20190300688-A1 POLYPROPYLENE RESIN COMPOSITION AND MONOLAYER AND MULTILAYER FILM MITSUI CHEMICALS, INC. (JP) 2019-10-03 US disclosed
EP-2275457-B1 Propylene-based polymer composition, and molded products, sheets, films, laminates and non-woven fabrics obtained therefrom MITSUI CHEMICALS INC (JP) 2016-11-23 EP disclosed