SCHEMBL18240508

SCHEMBL18240508

Cc1cc2c(cc1C(C)(C)C)-c1cc(C(C)(C)C)c(C)c([Zr](C3=CC=CC3)=C(c3ccc(I)cc3)c3ccc(I)cc3)c1C2

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL20994344 0.99
SCHEMBL4497658 0.92
SCHEMBL20721360 0.91
Hydrochloric Acid SCHEMBL18280804 0.91
SCHEMBL20721328 0.91
SCHEMBL20994354 0.91
Hydrochloric Acid SCHEMBL18280817 0.91
SCHEMBL4956926 0.91
Hydrochloric Acid SCHEMBL16528984 0.90
Hydrochloric Acid SCHEMBL18420078 0.90

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11492471-B2 Polypropylene resin composition and monolayer and multilayer film MITSUI CHEMICALS, INC. (JP) 2022-11-08 US disclosed
US-20190300688-A1 POLYPROPYLENE RESIN COMPOSITION AND MONOLAYER AND MULTILAYER FILM MITSUI CHEMICALS, INC. (JP) 2019-10-03 US disclosed
EP-2275457-B1 Propylene-based polymer composition, and molded products, sheets, films, laminates and non-woven fabrics obtained therefrom MITSUI CHEMICALS INC (JP) 2016-11-23 EP disclosed