SCHEMBL18242276

SCHEMBL18242276

[CH2]Cc1ccc(C(Cl)(Cl)C(Cl)(Cl)C(Cl)(Cl)C(Cl)(Cl)Cl)cc1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18242418 0.94 — —
SCHEMBL18242499 0.85 TSHR (0.30) —
SCHEMBL18244096 0.84 TAAR1 (0.31) —
SCHEMBL18242937 0.81 PTPN2 (0.35) —
SCHEMBL18243464 0.80 TSHR (0.30) —
SCHEMBL18378162 0.79 — —
SCHEMBL18243026 0.78 TAAR1 (0.31) —
SCHEMBL18377996 0.77 ACP3 (0.33) —
SCHEMBL18378128 0.76 PTPN2 (0.33) —
SCHEMBL5250772 0.75 TSHR (0.43) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10451967-B2 Acid- and radical-generating agent and method for generating acid and radical FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2019-10-22 — — US disclosed
US-20160342084-A1 ACID- AND RADICAL-GENERATING AGENT AND METHOD FOR GENERATING ACID AND RADICAL FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) 2016-11-24 — — US disclosed
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