Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX2 | P34913 | 14/20 | 0.47 |
| ▸ | MEN1 | O00255 | 1/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.43 |
| ▸ | ATM | Q13315 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.40 |
| ▸ | CNR2 | P34972 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1822930 | 0.99 | EPHX2 (0.48) | EPHX2MEN1KMT2AATMALDH1A1 | |
| SCHEMBL29030853 | 0.86 | EPHX2 (0.54) | EPHX2 | |
| SCHEMBL5893927 | 0.84 | EPHX2 (0.51) | EPHX2CNR2 | |
| SCHEMBL1821532 | 0.82 | EPHX2 (0.45) | EPHX2KMT2A | |
| SCHEMBL13113296 | 0.79 | CYP19A1 (0.37) | EPHX2MEN1KMT2AATMALDH1A1 | |
| SCHEMBL451260 | 0.79 | EPHX2 (0.37) | EPHX2MEN1KMT2AATMALDH1A1 | |
| SCHEMBL13113326 | 0.78 | EPHX2 (0.39) | EPHX2 | |
| SCHEMBL28179060 | 0.76 | KDM4E (0.39) | EPHX2ALDH1A1 | |
| SCHEMBL283707 | 0.76 | CYP19A1 (0.39) | EPHX2MEN1KMT2AALDH1A1 | |
| SCHEMBL13113329 | 0.74 | EPHX2 (0.45) | EPHX2MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7834113-B2 | Photoresist compositions and processes for preparing the same | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2010-11-16 | — | — | US | claimed |
| US-20060247400-A1 | Photoresist compositions and processes for preparing the same | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2006-11-02 | — | — | US | claimed |
| US-20060121390-A1 | High resolution resists for next generation lithographies | NATIONAL SCIENCE FOUNDATION | 2006-06-08 | — | — | US | claimed |
| EP-2970538-A1 | POLYMERIZATION PROCESS PROTECTION MEANS | E. I. du Pont de Nemours and Company (US) | 2016-01-20 | — | — | EP | disclosed |
| WO-2015017295-A1 | POLYMER PURIFICATION | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2015-02-05 | — | — | WO | disclosed |
| EP-2315739-B1 | NEW PROPANOATES AND PROCESSES FOR PREPARING THE SAME | DUPONT ELECTRONIC POLYMERS L P (US) | 2014-11-12 | — | — | EP | disclosed |
| WO-2014150700-A1 | POLYMERIZATION PROCESS PROTECTION MEANS | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2014-09-25 | — | — | WO | disclosed |
| EP-1699850-B1 | POLYMER PURIFICATION | DUPONT ELECTRONIC POLYMERS L P (US) | 2014-06-25 | — | — | EP | disclosed |
| EP-2315739-A1 | NEW PROPANOATES AND PROCESSES FOR PREPARING THE SAME | DuPont Electronic Polymers L.P. (US) | 2011-05-04 | — | — | EP | disclosed |
| US-7834113-B2 | Photoresist compositions and processes for preparing the same | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2010-11-16 | — | — | US | disclosed |
| WO-2010024841-A1 | NEW PROPANOATES AND PROCESSES FOR PREPARING THE SAME | DUPONT ELECTRONIC POLYMERS L.P. (US) | 2010-03-04 | — | — | WO | disclosed |
| US-20060247400-A1 | Photoresist compositions and processes for preparing the same | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2006-11-02 | — | — | US | disclosed |
| EP-1699850-A1 | POLYMER PURIFICATION | Dupont Electronic Polymers L.P. (US) | 2006-09-13 | — | — | EP | disclosed |
| WO-2006091375-A1 | ANHYDROUS, LIQUID PHASE PROCESS FOR PREPARING HYDROXYL CONTAINING POLYMERS OF ENHANCED PURITY | DUPONT ELECTRONIC POLYMERS L.P. (US) | 2006-08-31 | — | — | WO | disclosed |
| WO-2005061590-A1 | POLYMER PURIFICATION | DUPONT ELECTRONIC POLYMERS L.P. (US) | 2005-07-07 | — | — | WO | disclosed |
| EP-1497341-A1 | PREPARATION OF HOMO-, CO- AND TERPOLYMERS OF SUBSTITUTED STYRENES | Dupont Electronic Technologies L.P. (US) | 2005-01-19 | — | — | EP | disclosed |
| EP-1497339-A1 | ANHYDROUS, LIQUID PHASE PROCESS FOR PREPARING HYDROXYL CONTAINING POLYMERS OF ENHANCED PURITY | Dupont Electronic Technologies L.P. (US) | 2005-01-19 | — | — | EP | disclosed |
| EP-1479700-A1 | Processes for preparing photoresist compositions | E.I. DUPONT DE NEMOURS AND COMPANY (US) | 2004-11-24 | — | — | EP | disclosed |
| WO-2003089480-A1 | ANHYDROUS, LIQUID PHASE PROCESS FOR PREPARING HYDROXYL CONTAINING POLYMERS OF ENHANCED PURITY | DUPONT ELECTRONIC TECHNOLOGIES L.P. (US) | 2003-10-30 | — | — | WO | disclosed |
| WO-2003089482-A1 | PREPARATION OF HOMO-, CO- AND TERPOLYMERS OF SUBSTITUTED STYRENES | DUPONT ELECTRONIC TECHNOLOGIES L.P. (US) | 2003-10-30 | — | — | WO | disclosed |