SCHEMBL1826366

SCHEMBL1826366

C=CC(=O)OCC(CC(F)(F)F)OC

nearest known ligand 0.50

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
TSHR P16473 7/20 0.50
LPAR1 Q92633 2/20 0.38
ALDH1A1 P00352 4/20 0.37
TP53 P04637 3/20 0.37
HIF1A Q16665 3/20 0.37
CYP3A4 P08684 2/20 0.37
MAPK1 P28482 1/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
HPGD P15428 1/20 0.37
HSD17B10 Q99714 1/20 0.36
THRB P10828 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1822560 0.87 TSHR (0.47) TSHRLPAR1ALDH1A1TP53HIF1A
SCHEMBL18123454 0.84 TSHR (0.63) TSHRLPAR1ALDH1A1TP53HIF1A
SCHEMBL27913876 0.81 TSHR (0.47) TSHRLPAR1ALDH1A1TP53HIF1A
SCHEMBL23888850 0.79 TDP1 (0.40) LPAR1ALDH1A1HSD17B10
SCHEMBL891479 0.79 TSHR (0.57) TSHRLPAR1ALDH1A1TP53HIF1A
SCHEMBL11781129 0.79 TSHR (0.57) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL11964794 0.79 TSHR (0.57) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL19718525 0.79 TSHR (0.57) TSHRLPAR1ALDH1A1TP53HIF1A
SCHEMBL28559208 0.77 TSHR (0.50) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL27587747 0.77 TSHR (0.50) TSHRALDH1A1TP53HIF1ACYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101080674-B Composition for forming antireflection film, layered product, and method for forming resist pattern JSR CORP 2013-09-18 CN disclosed
EP-1818723-B1 COMPOSITION FOR FORMING ANTIREFLECTION FILM, LAYERED PRODUCT, AND METHOD OF FORMING RESIST PATTERN JSR CORP (JP) 2011-05-04 EP disclosed
CN-101080674-A Composition for forming antireflection film, layered product, and method for forming resist pattern JSR CORP (JP) 2007-11-28 CN disclosed
EP-1818723-A1 COMPOSITION FOR FORMING ANTIREFLECTION FILM, LAYERED PRODUCT, AND METHOD OF FORMING RESIST PATTERN JSR Corporation (JP) 2007-08-15 EP disclosed