SCHEMBL18315445

SCHEMBL18315445

C[SiH2]O[Si](C)(C)C.C[Si](C)(C)O[Si](C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7844 0.89
Ammonia Solution, Strong SCHEMBL5133479 0.86
Hydrochloric Acid SCHEMBL27667996 0.86
SCHEMBL28257098 0.86
SCHEMBL6822696 0.86
SCHEMBL10582117 0.86
SCHEMBL4443334 0.86
SCHEMBL11462035 0.86
Hydrochloric Acid SCHEMBL28981276 0.83
SCHEMBL6398945 0.83

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023183902-A1 METHODS FOR APPLYING DECORATIVE METAL FILMS ON POLYMERIC SURFACES VERGASON TECHNOLOGY, INC. (US) 2023-09-28 WO claimed
EP-2945976-B1 BLOCK COPOLYMERS HAVING A POLYDIMETHYLSILOXANE BLOCK BASF SE (DE) 2016-12-21 EP disclosed