SCHEMBL1835682

SCHEMBL1835682

[CH2]CCC(O)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11291878 0.83
SCHEMBL16186777 0.81 TSHR (0.37)
SCHEMBL4656343 0.75
SCHEMBL13814665 0.73
SCHEMBL23985 0.73
SCHEMBL8442881 0.73 TRPV1 (0.38)
SCHEMBL1495184 0.73
SCHEMBL17082618 0.73
SCHEMBL13616194 0.73
SCHEMBL17074061 0.72

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113227050-B Carbazole poly-beta-oxime ester derivative compound, photopolymerization initiator containing same, and photoresist composition 株式会社三养社 2024-03-12 CN claimed
CN-109896990-B Carbazole oxime ester derivative compound, photopolymerization initiator containing same, and photosensitive composition 株式会社三养社 2023-04-21 CN claimed
CN-109031888-A Colored photosensitive resin composition and light shield spacer prepared therefrom 罗门哈斯电子材料韩国有限公司 2018-12-18 CN claimed
CN-113227050-B Carbazole poly-beta-oxime ester derivative compound, photopolymerization initiator containing same, and photoresist composition 株式会社三养社 2024-03-12 CN disclosed
CN-116135889-A Oxime ester photoinitiator, photo-curing resin composition and application 常州强力电子新材料股份有限公司 2023-05-19 CN disclosed
CN-109896990-B Carbazole oxime ester derivative compound, photopolymerization initiator containing same, and photosensitive composition 株式会社三养社 2023-04-21 CN disclosed
CN-105916837-B Novel fluorenyl β -oxime ester compound, photopolymerization initiator comprising same, and photoresist composition 三养社 2019-09-24 CN disclosed
CN-107422603-A Photosensitive polymer combination and the photocuring pattern being produced from it 东友精细化工有限公司 2017-12-01 CN disclosed
CN-107111232-A Black matrix photoresist composition for liquid crystal display panel 三养社 2017-08-29 CN disclosed
CN-105700293-A Black photosensitive resin composition, black array and image display device comprising the same 东友精细化工有限公司 2016-06-22 CN disclosed
EP-2318415-A1 OXAZOLOPYRIMIDINES AS EDG-1 RECEPTOR AGONISTS Sanofi-Aventis (FR) 2011-05-11 EP disclosed
WO-2010006704-A1 OXAZOLOPYRIMIDINES AS EDG-1 RECEPTOR AGONISTS SANOFI-AVENTIS (FR) 2010-01-21 WO disclosed
EP-0191542-A1 Arylcyclobutylalkyl amines and their use as antidepressive medicines The Boots Company PLC (GB) 1986-08-20 EP disclosed