⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15663 | 0.84 | — | — | |
| Hydrogen Sulfide SCHEMBL7638603 | 0.84 | — | — | |
| SCHEMBL17144160 | 0.84 | — | — | |
| Methane SCHEMBL4558430 | 0.82 | — | — | |
| SCHEMBL8744575 | 0.82 | — | — | |
| SCHEMBL23199234 | 0.82 | — | — | |
| SCHEMBL539983 | 0.82 | — | — | |
| SCHEMBL6071615 | 0.82 | — | — | |
| SCHEMBL8773572 | 0.82 | — | — | |
| SCHEMBL11618219 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1614410-B1 | Dental materials polymerizable by photo-induced ring-opening metathesis polymerization of cyclic olefins | IVOCLAR VIVADENT AG (LI) | 2011-08-10 | — | — | EP | disclosed |
| EP-1833870-B1 | DURABLE COATING COMPOSITIONS CONTAINING NOVEL ASPARTIC AMINE COMPOUNDS | DU PONT (US) | 2011-05-11 | — | — | EP | disclosed |
| EP-1183571-B1 | FLUORINATED PHOTORESISTS AND PROCESSES FOR MICROLITHOGRAPHY | DU PONT (US) | 2010-06-02 | — | — | EP | disclosed |
| EP-1270553-B1 | Acid generator, sulfonic acid, sulfonic acid derivatives and radiation-sensitive resin composition | JSR CORP (JP) | 2009-11-18 | — | — | EP | disclosed |
| US-7314701-B2 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2008-01-01 | — | — | US | disclosed |
| US-7276323-B2 | Photoresists, polymers and processes for microlithography | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2007-10-02 | — | — | US | disclosed |
| US-7217495-B2 | Fluorinated polymers, photoresists and processes for microlithography | E I. DU PONT DE NEMOURS AND COMPANY (US) | 2007-05-15 | — | — | US | disclosed |
| EP-1383812-B1 | POLYCYCLIC FLUORINE-CONTAINING POLYMERS AND PHOTORESISTS FOR MICROLITHOGRAPHY | DU PONT (US) | 2006-05-31 | — | — | EP | disclosed |
| US-7045268-B2 | Polymers blends and their use in photoresist compositions for microlithography | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2006-05-16 | — | — | US | disclosed |
| EP-1278786-B1 | COPOLYMERS FOR PHOTORESISTS AND PROCESSES THEREFOR | DU PONT (US) | 2006-01-04 | — | — | EP | disclosed |
| WO-2002079287-A1 | POLYCYCLIC FLUORINE-CONTAINING POLYMERS AND PHOTORESISTS FOR MICROLITHOGRAPHY | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2002-10-10 | — | — | WO | disclosed |
| EP-1246013-A2 | Photoresists, polymers and processes for microlithography | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2002-10-02 | — | — | EP | disclosed |
| EP-1240554-A2 | NITRILE/FLUOROALCOHOL POLYMER-CONTAINING PHOTORESISTS AND ASSOCIATED PROCESSES FOR MICROLITHOGRAPHY | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2002-09-18 | — | — | EP | disclosed |
| WO-2002044811-A2 | POLYMERS BLENDS AND THEIR USE IN PHOTORESIST COMPOSITIONS FOR MICROLITHOGRAPHY | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2002-06-06 | — | — | WO | disclosed |
| WO-2002044814-A2 | PHOTORESIST COMPOSITIONS COMPRISING BASES AND SURFACTANTS FOR MICROLITHOGRAPHY | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2002-06-06 | — | — | WO | disclosed |
| WO-2001085811-A2 | COPOLYMERS FOR PHOTORESISTS AND PROCESSES THEREFOR | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2001-11-15 | — | — | WO | disclosed |
| EP-1131677-A1 | PHOTORESISTS, POLYMERS AND PROCESSES FOR MICROLITHOGRAPHY | E.I. DUPONT DE NEMOURS AND COMPANY (US) | 2001-09-12 | — | — | EP | disclosed |
| WO-2001037047-A2 | NITRILE/FLUOROALCOHOL POLYMER-CONTAINING PHOTORESISTS AND ASSOCIATED PROCESSES FOR MICROLITHOGRAPHY | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2001-05-25 | — | — | WO | disclosed |
| WO-2000017712-A1 | PHOTORESISTS, POLYMERS AND PROCESSES FOR MICROLITHOGRAPHY | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 2000-03-30 | — | — | WO | disclosed |
| US-4059561-A | AND A HALOGEN COMPOUND | SHOWA DENKO KABUSHIKI KAISHA (JA) | 1977-11-22 | — | — | US | disclosed |