Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA9 | Q16790 | 11/20 | 0.53 |
| ▸ | CA12 | O43570 | 9/20 | 0.53 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.43 |
| ▸ | GLA | P06280 | 1/20 | 0.43 |
| ▸ | POLB | P06746 | 1/20 | 0.43 |
| ▸ | GAA | P10253 | 1/20 | 0.43 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.43 |
| ▸ | CYP2A6 | P11509 | 1/20 | 0.40 |
| ▸ | CA1 | P00915 | 2/20 | 0.39 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.37 |
| ▸ | GAPDH | P04406 | 1/20 | 0.37 |
| ▸ | ACHE | P22303 | 1/20 | 0.37 |
| ▸ | MEN1 | O00255 | 1/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.37 |
| ▸ | CA4 | P22748 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL75401 | 0.81 | CA9 (0.74) | CA9CA12KDM4EGLAPOLB | |
| SCHEMBL557165 | 0.73 | CA12 (0.73) | CA9CA12KDM4EGLAPOLB | |
| SCHEMBL16283612 | 0.71 | CA12 (1.00) | CA9CA12KDM4EGLAPOLB | |
| SCHEMBL18897994 | 0.71 | CA9 (0.45) | CA9CA12KDM4EGLAPOLB | |
| SCHEMBL803231 | 0.67 | ELANE (0.56) | CA9CA12KDM4EGLAPOLB | |
| SCHEMBL13609736 | 0.66 | MCL1 (0.69) | CA9CA12KDM4EGLAPOLB | |
| SCHEMBL27265450 | 0.66 | CA9 (0.71) | CA9CA12KDM4EGLAPOLB | |
| SCHEMBL23963403 | 0.66 | CA12 (0.70) | CA9CA12KDM4EGLAPOLB | |
| SCHEMBL15357800 | 0.65 | ELANE (0.50) | CA9CA12KDM4EGLAPOLB | |
| SCHEMBL3566985 | 0.65 | ELANE (0.53) | CA9CA12KDM4EGLAPOLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9551932-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-01-24 | — | — | US | disclosed |