⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL811512 | 0.83 | — | — | |
| SCHEMBL22307567 | 0.83 | — | — | |
| SCHEMBL12013400 | 0.79 | — | — | |
| SCHEMBL28345963 | 0.79 | — | — | |
| SCHEMBL10018606 | 0.78 | — | — | |
| SCHEMBL2608666 | 0.78 | — | — | |
| SCHEMBL13201986 | 0.76 | — | — | |
| SCHEMBL15112959 | 0.74 | — | — | |
| SCHEMBL8655255 | 0.74 | — | — | |
| SCHEMBL23202598 | 0.71 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11662663-B2 | Substrate protective film-forming composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-30 | — | — | US | disclosed |
| US-9551932-B2 | Patterning process and resist composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-01-24 | — | — | US | disclosed |