⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2641628 | 0.80 | — | — | |
| SCHEMBL18792495 | 0.80 | — | — | |
| SCHEMBL18560270 | 0.76 | TSHR (0.33) | — | |
| SCHEMBL18804232 | 0.74 | — | — | |
| SCHEMBL18804236 | 0.72 | TSHR (0.33) | — | |
| SCHEMBL18804293 | 0.72 | — | — | |
| SCHEMBL18804301 | 0.70 | — | — | |
| SCHEMBL18804270 | 0.70 | — | — | |
| SCHEMBL19840163 | 0.69 | — | — | |
| SCHEMBL18804194 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10351584-B2 | Alkoxide compound, raw material for forming thin film, method for manufacturing thin film, and alcohol compound | ADEKA CORPORATION (JP) | 2019-07-16 | — | — | US | disclosed |
| US-20170121358-A1 | ALKOXIDE COMPOUND, RAW MATERIAL FOR FORMING THIN FILM, METHOD FOR MANUFACTURING THIN FILM, AND ALCOHOL COMPOUND | ADEKA CORPORATION (JP) | 2017-05-04 | — | — | US | disclosed |
| US-20170121358-A1 | ALKOXIDE COMPOUND, RAW MATERIAL FOR FORMING THIN FILM, METHOD FOR MANUFACTURING THIN FILM, AND ALCOHOL COMPOUND | ADEKA CORPORATION (JP) | 2017-05-04 | — | — | US | disclosed |
| EP-3135664-A1 | ALKOXIDE COMPOUND, RAW MATERIAL FOR FORMING THIN FILM, METHOD FOR PRODUCING THIN FILM, AND ALCOHOL COMPOUND | Adeka Corporation (JP) | 2017-03-01 | — | — | EP | disclosed |