SCHEMBL18644307

SCHEMBL18644307

Cc1cccc2c(C(c3ccc(-c4ccccc4)cc3)c3c(O)ccc4c(O)cccc34)c(O)ccc12

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NQO1 P15559 1/20 0.41
HSD17B1 P14061 4/20 0.38
HSD17B2 P37059 4/20 0.38
IDO1 P14902 1/20 0.35
CYP1A2 P05177 1/20 0.35
CYP2A6 P11509 1/20 0.35
ESR2 Q92731 3/20 0.35
MEN1 O00255 2/20 0.35
ESR1 P03372 2/20 0.35
KMT2A Q03164 2/20 0.35
GAA P10253 2/20 0.34
CDK4 P11802 1/20 0.34
CCND1 P24385 1/20 0.34
AHR P35869 1/20 0.34
ACP3 P15309 2/20 0.33
ALOX5 P09917 1/20 0.33
PTGS2 P35354 1/20 0.33
TYMS P04818 1/20 0.33
MGAM O43451 1/20 0.32
SI P14410 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15998787 0.92 NQO1 (0.47) NQO1HSD17B1HSD17B2IDO1CYP1A2
SCHEMBL18644306 0.83 NQO1 (0.38) NQO1HSD17B1HSD17B2CYP1A2CYP2A6
SCHEMBL26388789 0.82 IDO1 (0.48) NQO1IDO1CYP1A2ESR2MEN1
SCHEMBL19047442 0.79 NQO1 (0.40) NQO1HSD17B1HSD17B2IDO1CYP1A2
SCHEMBL11534689 0.75 AHR (0.50) NQO1CYP1A2ESR2MEN1KMT2A
SCHEMBL26389055 0.73 ESR2 (0.41) NQO1HSD17B1HSD17B2CYP1A2ESR2
SCHEMBL25141476 0.73 ESR2 (0.46) NQO1HSD17B1HSD17B2CYP1A2ESR2
SCHEMBL15998805 0.73 NQO1 (0.43) NQO1HSD17B1HSD17B2IDO1CYP1A2
SCHEMBL1101882 0.72 CYP1A2 (0.68) HSD17B1HSD17B2IDO1CYP1A2CYP2A6
SCHEMBL26388816 0.71 NQO1 (0.49) NQO1HSD17B1HSD17B2IDO1CYP1A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9598392-B2 Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2017-03-21 US disclosed