Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 1/20 | 0.37 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
| ▸ | CA1 | P00915 | 1/20 | 0.33 |
| ▸ | CA2 | P00918 | 1/20 | 0.33 |
| ▸ | CA4 | P22748 | 1/20 | 0.33 |
| ▸ | ACHE | P22303 | 1/20 | 0.33 |
| ▸ | CA12 | O43570 | 1/20 | 0.31 |
| ▸ | CA7 | P43166 | 1/20 | 0.31 |
| ▸ | CA9 | Q16790 | 1/20 | 0.31 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Methane SCHEMBL20636774 | 1.00 | KMT2A (0.37) | KMT2AEPHX1ALDH1A1CA1CA2 | |
| SCHEMBL27523277 | 0.97 | KMT2A (0.39) | KMT2AEPHX1ALDH1A1CA1CA2 | |
| SCHEMBL265848 | 0.97 | KMT2A (0.39) | KMT2AEPHX1ALDH1A1CA1CA2 | |
| Cyclohexane SCHEMBL9547725 | 0.97 | KMT2A (0.39) | KMT2AEPHX1ALDH1A1CA1CA2 | |
| SCHEMBL15575 | 0.97 | KMT2A (0.39) | KMT2AEPHX1ALDH1A1CA1CA2 | |
| SCHEMBL498527 | 0.97 | KMT2A (0.39) | KMT2AEPHX1ALDH1A1CA1CA2 | |
| SCHEMBL28843554 | 0.97 | KMT2A (0.39) | KMT2AEPHX1ALDH1A1CA1CA2 | |
| Methylcyclopentane SCHEMBL3876187 | 0.94 | CA1 (0.36) | KMT2AEPHX1ALDH1A1CA1CA2 | |
| Acetic Acid SCHEMBL28484765 | 0.85 | EPHX1 (0.41) | KMT2AEPHX1ALDH1A1 | |
| Cyanate SCHEMBL28145888 | 0.85 | EPHX1 (0.36) | KMT2AEPHX1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8535874-B2 | Fluorene-based polymer containing urethane groups, preparation method thereof and negative-type photosensitive resin composition comprising the same | LG CHEM, LTD. (KR) | 2013-09-17 | — | — | US | claimed |
| CN-101631815-B | Fluorene-based polymer containing urethane group, method of preparing the same, and negative-type photosensitive resin composition comprising the same | LG CHEMICAL LTD | 2012-05-23 | — | — | CN | claimed |
| US-20100201925-A1 | FLUORENE-BASED POLYMER CONTAINING URETHANE GROUPS, PREPARATION METHOD THEREOF AND NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME | LG CHEM LTD. (KR) | 2010-08-12 | — | — | US | claimed |
| CN-101631815-A | Fluorene-based polymer containing urethane groups, preparation method thereof and negative-type photosensitive resin composition comprising the same | LG CHEMICAL LTD | 2010-01-20 | — | — | CN | claimed |
| CN-107636536-B | Resin composition and display device including black bank manufactured by using the same | 株式会社LG化学 | 2020-09-08 | — | — | CN | disclosed |
| US-10578967-B2 | Resin composition, and display device comprising black bank manufactured by using same | LG CHEM, LTD. (KR) | 2020-03-03 | — | — | US | disclosed |
| US-20180180995-A1 | RESIN COMPOSITION, AND DISPLAY DEVICE COMPRISING BLACK BANK MANUFACTURED BY USING SAME | LG CHEM, LTD. (KR) | 2018-06-28 | — | — | US | disclosed |
| CN-104335120-B | Photosensitive resin composition, pattern formed using the same, and display panel including the same | 株式会社LG化学 | 2018-04-03 | — | — | CN | disclosed |
| US-9733563-B2 | Photosensitive resin composition and photosensitive material comprising the same | LG CHEM, LTD. (KR) | 2017-08-15 | — | — | US | disclosed |
| US-9341946-B2 | Photosensitive resin composition, pattern formed using same and display panel comprising same | LG CHEM, LTD. (KR) | 2016-05-17 | — | — | US | disclosed |
| US-20150125789-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMED USING SAME AND DISPLAY PANEL COMPRISING SAME | LG CHEM, LTD. (KR) | 2015-05-07 | — | — | US | disclosed |
| CN-104536263-A | Photosensitive resin composition for black matrix | LG CHEMICAL LTD | 2015-04-22 | — | — | CN | disclosed |
| US-20130034814-A1 | SILANE-BASED COMPOUNDS AND PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME | LG CHEM, LTD. (KR) | 2013-02-07 | — | — | US | disclosed |
| US-20120189961-A1 | PHOTOSENSITIVE RESIN COMPOSITION AND PHOTOSENSITIVE MATERIAL COMPRISING THE SAME | LG CHEM, LTD. (KR) | 2012-07-26 | — | — | US | disclosed |
| CN-101631815-B | Fluorene-based polymer containing urethane group, method of preparing the same, and negative-type photosensitive resin composition comprising the same | LG CHEMICAL LTD | 2012-05-23 | — | — | CN | disclosed |
| US-20110101268-A1 | PHOTOSENSITIVE RESIN COMPOSITION FOR BLACK MATRIX | LG CHEM, LTD. (KR) | 2011-05-05 | — | — | US | disclosed |
| CN-102007450-A | Photosensitive resin composition for black matrix | LG CHEMICAL LTD | 2011-04-06 | — | — | CN | disclosed |
| US-20100201925-A1 | FLUORENE-BASED POLYMER CONTAINING URETHANE GROUPS, PREPARATION METHOD THEREOF AND NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME | LG CHEM LTD. (KR) | 2010-08-12 | — | — | US | disclosed |
| CN-101631815-A | Fluorene-based polymer containing urethane groups, preparation method thereof and negative-type photosensitive resin composition comprising the same | LG CHEMICAL LTD | 2010-01-20 | — | — | CN | disclosed |
| WO-2009048231-A2 | FLUORENE-BASED POLYMER CONTAINING URETHANE GROUPS, PREPARATION METHOD THEREOF AND NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME | LG CHEM. LTD. (KR) | 2009-04-16 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20130034814-A1 | SILANE-BASED COMPOUNDS AND PHOTOSENSITIVE RESIN COMPOSITION COMPRISING THE SAME | CD47, EPCAM, EED | KMT2A 212/4885EPHX1 1673/4885ALDH1A1 985/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.