SCHEMBL18774602

SCHEMBL18774602

[SiH3]N([SiH3])[SiH2]N([SiH3])[SiH2]N([SiH3])[SiH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19958864 0.95
SCHEMBL30640723 0.76
SCHEMBL16302740 0.70
SCHEMBL17970242 0.64
SCHEMBL20377483 0.64
SCHEMBL23382219 0.56
SCHEMBL19958866 0.53
SCHEMBL16600650 0.53
Ammonia Solution, Strong SCHEMBL5363838 0.42
SCHEMBL11554337 0.39

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11739220-B2 Perhydropolysilazane compositions and methods for forming oxide films using same L'Air Liquide, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude (FR) 2023-08-29 US disclosed
US-20180072571-A1 N-H FREE AND SI-RICH PER-HYDRIDOPOLYSILZANE COMPOSITIONS, THEIR SYNTHESIS, AND APPLICATIONS L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) 2018-03-15 US disclosed
US-20170114465-A1 Methods Of Depositing Flowable Films Comprising SiO and SiN APPLIED MATERIALS, INC. 2017-04-27 US disclosed