⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19251144 | 1.00 | — | — | |
| SCHEMBL18594802 | 0.83 | — | — | |
| SCHEMBL18389194 | 0.83 | — | — | |
| SCHEMBL19738676 | 0.81 | — | — | |
| SCHEMBL19563317 | 0.78 | — | — | |
| SCHEMBL19011639 | 0.77 | — | — | |
| SCHEMBL18380828 | 0.77 | — | — | |
| SCHEMBL21432737 | 0.77 | — | — | |
| SCHEMBL15942976 | 0.77 | — | — | |
| SCHEMBL20705475 | 0.77 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230348371-A1 | SULFONYLUREA DERIVATIVE AND MEDICAL USES THEREOF | JIANGSU HENGRUI PHARMACEUTICALS CO., LTD. (CN) | 2023-11-02 | — | — | US | disclosed |
| US-20230138480-A1 | COMPOUNDS AND USES THEREOF | FOGHORN THERAPEUTICS INC. | 2023-05-04 | — | — | US | disclosed |
| US-11165026-B2 | Heterocyclic compound and organic electroluminescence device including the same | SAMSUNG DISPLAY CO., LTD. (KR) | 2021-11-02 | — | — | US | disclosed |
| EP-3279727-B1 | COMPOUND, RESIST COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN USING IT | MITSUBISHI GAS CHEMICAL CO (JP) | 2021-06-09 | — | — | EP | disclosed |
| US-20210038611-A1 | COMPOUNDS AND USES THEREOF | FOGHORN THERAPEUTICS INC. | 2021-02-11 | — | — | US | disclosed |
| EP-3279190-A1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND POLYPHENOL COMPOUND USED THEREIN | Mitsubishi Gas Chemical Company, Inc. (JP) | 2018-02-07 | — | — | EP | disclosed |
| EP-3279728-A1 | RESIST BASE MATERIAL, RESIST COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN | Mitsubishi Gas Chemical Company, Inc. (JP) | 2018-02-07 | — | — | EP | disclosed |
| US-9637634-B2 | Flame-retardant polycarbonate molding materials V | COVESTRO DEUTSCHLAND AG (DE) | 2017-05-02 | — | — | US | disclosed |