SCHEMBL18800136

SCHEMBL18800136

CCCCC(=O)CCCCC(C)(C)C

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 2/20 0.50
MAPT P10636 1/20 0.50
CES2 O00748 5/20 0.44
CES1 P23141 5/20 0.44
ALDH1A1 P00352 4/20 0.41
AKR1B1 P15121 1/20 0.41
TP53 P04637 1/20 0.41
HAO1 Q9UJM8 1/20 0.41
FAAH O00519 1/20 0.40
PPARG P37231 6/20 0.39
PPARD Q03181 6/20 0.39
PPARA Q07869 6/20 0.39
HDAC11 Q96DB2 5/20 0.39
TSHR P16473 4/20 0.39
GPR84 Q9NQS5 4/20 0.39
TLR2 O60603 2/20 0.39
TDP1 Q9NUW8 2/20 0.39
FABP4 P15090 2/20 0.39
PTPN1 P18031 2/20 0.39
SLC22A6 Q4U2R8 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8896875 0.98 KMT2A (0.54) KMT2AMAPTCES2CES1ALDH1A1
SCHEMBL8896880 0.93 KMT2A (0.59) KMT2AMAPTCES2CES1ALDH1A1
SCHEMBL8896816 0.93 KMT2A (0.59) KMT2AMAPTCES2CES1ALDH1A1
SCHEMBL28332249 0.93 MAPT (0.46) KMT2AMAPTCES2CES1ALDH1A1
SCHEMBL15457429 0.91 MAPT (0.41) KMT2AMAPTCES2CES1ALDH1A1
SCHEMBL8896912 0.89 KMT2A (0.48) KMT2AMAPTCES2CES1ALDH1A1
SCHEMBL8896005 0.89 KMT2A (0.59) KMT2AMAPTCES2CES1ALDH1A1
SCHEMBL15457430 0.88 KMT2A (0.44) KMT2AMAPTCES2CES1ALDH1A1
SCHEMBL491385 0.86 KMT2A (0.56) KMT2AMAPTCES2CES1ALDH1A1
SCHEMBL25885737 0.85 MAPT (0.41) KMT2AMAPTCES2CES1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9636670-B2 Catalysts, ligands and use thereof OXFORD UNIVERSITY INNOVATION LIMITED (GB) 2017-05-02 US disclosed
US-9627217-B2 Silicon-containing EUV resist underlayer film-forming composition including additive NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2017-04-18 US disclosed
US-20150079792-A1 SILICON-CONTAINING EUV RESIST UNDERLAYER FILM-FORMING COMPOSITION INCLUDING ADDITIVE NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2015-03-19 US disclosed