SCHEMBL1882824

SCHEMBL1882824

CC[CH][Si]([Si]1(C)CCCC(C)(C)O1)([Si]1(C)CCCC(C)(C)O1)[Si]1(C)CCCC(C)(C)O1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3680804 0.86
SCHEMBL4395336 0.69
SCHEMBL28327789 0.66
SCHEMBL8204516 0.65
SCHEMBL431503 0.64
SCHEMBL3823389 0.63
SCHEMBL28813295 0.63
SCHEMBL21679574 0.62
SCHEMBL16823360 0.61
SCHEMBL27533324 0.61

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0455585-B1 Unsaturated urea polysiloxanes CIBA GEIGY AG (CH) 1994-03-23 EP claimed
EP-3330751-B1 METHOD OF PRODUCING A PHOTOCHROMIC LAMINATE TOKUYAMA CORP (JP) 2021-05-26 EP disclosed
EP-3269774-B1 METHOD FOR PRODUCING PHOTOCHROMIC CURED BODY TOKUYAMA CORP (JP) 2020-12-09 EP disclosed
EP-3070142-B1 PHOTOCHROMIC COMPOSITION TOKUYAMA CORP (JP) 2019-05-22 EP disclosed
US-10125309-B2 Photochromic composition TOKUYAMA CORPORATION (JP) 2018-11-13 US disclosed
US-20180244931-A1 PHOTOCHROMIC COATING COMPOSITION TOKUYAMA CORPORATION (JP) 2018-08-30 US disclosed
EP-3330751-A1 PHOTOCHROMIC COATING COMPOSITION Tokuyama Corporation (JP) 2018-06-06 EP disclosed
US-20180030341-A1 PROCESS FOR PRODUCING A PHOTOCHROMIC CURED BODY TOKUYAMA CORPORATION (JP) 2018-02-01 US disclosed
EP-3269774-A1 METHOD FOR PRODUCING PHOTOCHROMIC CURED BODY Tokuyama Corporation (JP) 2018-01-17 EP disclosed
EP-1666969-B1 PHOTOSENSITIVE INSULATING RESIN COMPOSITION AND CURED PRODUCT THEREOF JSR CORP (JP) 2018-01-10 EP disclosed
US-20110105688-A1 POLYROTAXANE, CROSSLINKED STRUCTURE COMPRISING POLYROTAXANE AND POLYMER, AND PROCESSES FOR PRODUCING THESE ADVANCED SOFTMATERIALS INC. (JP) 2011-05-05 US disclosed
US-7812096-B2 Modification method of polymer THE YOKOHAMA RUBBER CO., LTD. (JP) 2010-10-12 US disclosed
EP-2174960-A1 POLYROTAXANE, CROSSLINKED STRUCTURE COMPRISING POLYROTAXANE AND POLYMER, AND PROCESSES FOR PRODUCING THESE Advanced Softmaterials Inc. (JP) 2010-04-14 EP disclosed
US-20090292044-A1 MODIFIED DIENE-BASED RUBBER AND RUBBER COMPOSITION CONTAINING THE SAME THE YOKOHAMA RUBBER CO., LTD. (JP) 2009-11-26 US disclosed
US-20090258275-A1 POLYMER ELECTROLYTE, POLYMER ELECTROLYTE MEMBRANE, MEMBRANE ELECTRODE ASSEMBLY, AND FUEL CELL CANON KABUSHIKI KAISHA (JP) 2009-10-15 US disclosed
EP-2039705-A1 MODIFIED DIENE RUBBER AND RUBBER COMPOSITION CONTAINING THE SAME The Yokohama Rubber Co., Ltd. (JP) 2009-03-25 EP disclosed
US-20070027231-A1 Photosensitive insulating resin composition and cured product thereof JSR CORPORATION (JP) 2007-02-01 US disclosed
US-20060210929-A1 Photosensitive composition and forming process of structured material using the composition CANON KABUSHIKI KAISHA (JP) 2006-09-21 US disclosed
US-20060160956-A1 Modification method of polymer THE YOKOHAMA RUBBER CO., LTD. 2006-07-20 US disclosed
EP-1666969-A1 PHOTOSENSITIVE INSULATING RESIN COMPOSITION AND CURED PRODUCT THEREOF JSR Corporation (JP) 2006-06-07 EP disclosed