SCHEMBL1883487

SCHEMBL1883487

COC(OC)C([SiH3])CC(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL8148380 0.68
SCHEMBL7050863 0.67
SCHEMBL5431731 0.67
SCHEMBL9617144 0.65
SCHEMBL9722519 0.65
SCHEMBL25363599 0.65
SCHEMBL15487813 0.65
SCHEMBL1880757 0.64
SCHEMBL21246430 0.63
SCHEMBL22817582 0.63

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-5246776-A None JP disclosed
EP-3135745-B1 SEMICONDUCTOR NANOPARTICLE ASSEMBLY AND METHOD FOR PRODUCING SAME KONICA MINOLTA INC (JP) 2021-03-10 EP disclosed
US-10208245-B2 Semiconductor nanoparticle assembly and method for manufacturing the same Konica Minolta, Inc. (JP) 2019-02-19 US disclosed
US-20170210981-A1 SEMICONDUCTOR NANOPARTICLE ASSEMBLY AND METHOD FOR MANUFACTURING THE SAME Konica Minolta, Inc. (JP) 2017-07-27 US disclosed
EP-3135745-A1 SEMICONDUCTOR NANOPARTICLE ASSEMBLY AND METHOD FOR PRODUCING SAME Konica Minolta, Inc. (JP) 2017-03-01 EP disclosed
US-8178276-B2 Method of manufacturing toner RICOH COMPANY LIMITED (JP) 2012-05-15 US disclosed
US-7939235-B2 Using toner having properties preventing whiteout and other abnormalities; continuous, long term production of quality images at super high speed RICOH COMPANY LIMITED (JP) 2011-05-10 US disclosed
US-20090226836-A1 METHOD OF MANUFACTURING TONER RICOH COMPANY LIMITED (JP) 2009-09-10 US disclosed
US-20080227000-A1 IMAGE FORMATION METHOD RICOH COMPANY LIMITED (JP) 2008-09-18 US disclosed
US-6861195-B2 Image forming method KONICA CORPORATION (JP) 2005-03-01 US disclosed
US-20040141771-A1 Image forming method OSHIBA TAKEO (JP) 2004-07-22 US disclosed
US-6692882-B2 CYLINDER SUBSTRATE OVERCOATED WITH PHOTOSENSITIVE COMPOUND; IMAGEWISE EXPOSURE; DEVELOPMENT LATENT IMAGES KONICA CORPORATION (JP) 2004-02-17 US disclosed
US-20020142239-A1 Electrophotographic photoreceptor, image forming apparatus and processing cartridge KONICA CORPORATION (JP) 2002-10-03 US disclosed
US-20020110748-A1 Cylinder substrate overcoated with photosensitive compound; imagewise exposure; development latent images KONICA CORPORATION (JP) 2002-08-15 US disclosed
JP-H05246776-A METHOD FOR CHEMICAL MODIFYING MICA SURFACE RES DEV CORP OF JAPAN 1993-09-24 JP disclosed
US-4946611-A LUBRICANT, COMPATIBLE WITH FLON REFRIGERANTS IDEMITSU KOSAN CO., LTD. (JP) 1990-08-07 US disclosed