⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18841767 | 0.91 | — | — | |
| SCHEMBL18845031 | 0.91 | — | — | |
| SCHEMBL20707684 | 0.89 | — | — | |
| SCHEMBL18842273 | 0.89 | — | — | |
| SCHEMBL18842278 | 0.87 | — | — | |
| SCHEMBL21208279 | 0.85 | CLK1 (0.30) | — | |
| SCHEMBL775982 | 0.83 | — | — | |
| SCHEMBL18845264 | 0.83 | — | — | |
| SCHEMBL18841785 | 0.82 | — | — | |
| SCHEMBL18841848 | 0.81 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10591819-B2 | Monomer, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2020-03-17 | — | — | US | disclosed |
| US-20190235381-A1 | MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-08-01 | — | — | US | disclosed |
| EP-3168207-A1 | MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2017-05-17 | — | — | EP | disclosed |
| US-20170131635-A1 | MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-05-11 | — | — | US | disclosed |