SCHEMBL18907150

SCHEMBL18907150

[C-]#[N+]c1c(Oc2cccc(NCC#C)c2)cccc1Oc1cc2c(cc1Oc1cccc(Oc3cccc(NCC#C)c3)c1[N+]#[C-])C1(CC(C)(C)c3cc(Oc4cccc(Oc5cccc(NCC#C)c5)c4C#N)c(Oc4cccc(Oc5cccc(NCC#C)c5)c4C#N)cc31)CC2(C)C

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
MAPT P10636 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18914614 0.93 MAPT (0.35) MAPT
SCHEMBL18907152 0.85
SCHEMBL18907155 0.85
SCHEMBL20087264 0.84
SCHEMBL18907154 0.83 MEN1 (0.31)
SCHEMBL18179346 0.83 MEN1 (0.37) MAPT
SCHEMBL18907153 0.83
SCHEMBL18914474 0.81 MAPT (0.36) MAPT
SCHEMBL17427502 0.81 MAPT (0.33) MAPT
SCHEMBL18914472 0.80 BRAF (0.31)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20180114698-A2 COMPOSITION FOR FILM FORMATION, FILM, PRODUCTION METHOD OF PATTERNED SUBSTRATE, AND COMPOUND JSR CORPORATION (JP) 2018-04-26 US disclosed
US-20170154782-A1 COMPOSITION FOR FILM FORMATION, FILM, PRODUCTION METHOD OF PATTERNED SUBSTRATE, AND COMPOUND JSR CORPORATION (JP) 2017-06-01 US disclosed