Fluoride Ion

Fluoride Ion

SCHEMBL1896493

Cn1cc[n+](C)c1.[F-]

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Fluoride SCHEMBL28440237 0.97
SCHEMBL35176 0.97
Water SCHEMBL5669355 0.94
Iodide SCHEMBL8151273 0.94 MEN1 (0.39)
SCHEMBL8901949 0.94 MEN1 (0.39)
SCHEMBL8901943 0.94 MEN1 (0.39)
Bromide SCHEMBL556902 0.94
Iodide SCHEMBL359425 0.94
SCHEMBL31000062 0.94
SCHEMBL30698001 0.94

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11479473-B2 Method for manufacturing a nanoparticle material and a fluoride ion battery AMBERCON TECHNOLOGY (UK) LIMITED (GB) 2022-10-25 US claimed
US-20210070626-A1 A Method for Manufacturing a Nanoparticle Material and a Fluoride Ion Battery AMBERCON TECHNOLOGY (UK) LTD (GB) 2021-03-11 US claimed
EP-3676897-A1 A METHOD FOR MANUFACTURING A NANOPARTICLE MATERIAL AND A FLUORIDE ION BATTERY Ambercon Technology (UK) Limited (GB) 2020-07-08 EP claimed
CN-111263994-A Method for producing nanoparticle material and fluorine ion battery 安博康技术(英国)有限公司 2020-06-09 CN claimed
WO-2019042518-A1 A METHOD FOR MANUFACTURING A NANOPARTICLE MATERIAL AND A FLUORIDE ION BATTERY WITTER RAIKER (EE) 2019-03-07 WO claimed
US-12552762-B2 Fluorolactone and method for producing same DAIKIN INDUSTRIES, LTD. (JP) 2026-02-17 US disclosed
US-20260047371-A1 METHOD TO SELECTIVELY ETCH SILICON NITRIDE TO SILICON OXIDE USING SURFACE ALKYLATION TOKYO ELECTRON LTD (JP) 2026-02-12 US disclosed
US-12494375-B2 Method to selectively etch silicon nitride to silicon oxide using surface alkylation TOKYO ELECTRON LIMITED (JP) 2025-12-09 US disclosed
US-12410150-B2 Fluorolactone and method for producing same DAIKIN INDUSTRIES, LTD. (JP) 2025-09-09 US disclosed
EP-4592282-A2 FLUOROLACTONE AND METHOD FOR PRODUCING SAME DAIKIN INDUSTRIES, LTD. (JP) 2025-07-30 EP disclosed
CN-113825747-B Fluorolactones and process for producing the same 大金工业株式会社 2025-04-25 CN disclosed
WO-2025048934-A1 METHOD TO SELECTIVELY ETCH SILICON NITRIDE TO SILICON OXIDE USING SURFACE ALKYLATION TOKYO ELECTRON LIMITED (JP) 2025-03-06 WO disclosed
EP-1698606-B1 FLUORINATING AGENT AND METHOD FOR PRODUCING FLUORINE-CONTAINING COMPOUND USING SAME SUMITOMO CHEMICAL CO (JP) 2013-02-20 EP disclosed
US-8071813-B2 Methods of using ionic liquids having a fluoride anion as solvents LAWRENCE LIVERMORE NATIONAL SECURITY, LLC (US) 2011-12-06 US disclosed
US-7939697-B2 Fluorinating agent and method for producing fluorine-containing compound using the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-05-10 US disclosed
US-20090287025-A1 Fluorinating agent and method for producing fluorine-containing compound using the same SUMITOMO CHEMICAL COMPANY, LIMITED 2009-11-19 US disclosed
US-7569703-B2 Fluorinating agent and method for producing fluorine-containing compound using the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-08-04 US disclosed
US-20090012297-A1 Ionic liquids as solvents ENERGY, U.S. DEPARTMENT OF 2009-01-08 US disclosed
US-20070135634-A1 Fluorinating agent and method for producing fluorine-containing compound using the same SUMITOMO CHEMICAL COMPANY, LIMITED 2007-06-14 US disclosed
EP-1698606-A1 FLUORINATING AGENT AND METHOD FOR PRODUCING FLUORINE-CONTAINING COMPOUND USING SAME Sumitomo Chemical Company, Limited (JP) 2006-09-06 EP disclosed