Fluoride

Fluoride

SCHEMBL1896494

CN1C=CN(C)C1.F

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Iodide SCHEMBL8151277 0.92
Bromide SCHEMBL27978789 0.88
SCHEMBL28296549 0.82
SCHEMBL27809614 0.82
Bicarbonate SCHEMBL28061950 0.82 CA1 (0.33)
SCHEMBL1116198 0.80
Acetic Acid SCHEMBL26656964 0.79 FFAR3 (0.44)
Ethylene Glycol SCHEMBL28006012 0.79 TSHR (0.31)
SCHEMBL27727204 0.79
SCHEMBL28279689 0.79

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111263994-A Method for producing nanoparticle material and fluorine ion battery 安博康技术(英国)有限公司 2020-06-09 CN claimed
US-20260047371-A1 METHOD TO SELECTIVELY ETCH SILICON NITRIDE TO SILICON OXIDE USING SURFACE ALKYLATION TOKYO ELECTRON LTD (JP) 2026-02-12 US disclosed
US-12494375-B2 Method to selectively etch silicon nitride to silicon oxide using surface alkylation TOKYO ELECTRON LIMITED (JP) 2025-12-09 US disclosed
WO-2025048934-A1 METHOD TO SELECTIVELY ETCH SILICON NITRIDE TO SILICON OXIDE USING SURFACE ALKYLATION TOKYO ELECTRON LIMITED (JP) 2025-03-06 WO disclosed
US-20250079181-A1 METHOD TO SELECTIVELY ETCH SILICON NITRIDE TO SILICON OXIDE USING SURFACE ALKYLATION TOKYO ELECTRON LIMITED (JP) 2025-03-06 US disclosed
CN-111263994-B Method for producing nanoparticle material and fluorine ion battery 瑞克·韦特 2024-03-01 CN disclosed
CN-111263994-A Method for producing nanoparticle material and fluorine ion battery 安博康技术(英国)有限公司 2020-06-09 CN disclosed
EP-1698606-B1 FLUORINATING AGENT AND METHOD FOR PRODUCING FLUORINE-CONTAINING COMPOUND USING SAME SUMITOMO CHEMICAL CO (JP) 2013-02-20 EP disclosed
US-8071813-B2 Methods of using ionic liquids having a fluoride anion as solvents LAWRENCE LIVERMORE NATIONAL SECURITY, LLC (US) 2011-12-06 US disclosed
US-7939697-B2 Fluorinating agent and method for producing fluorine-containing compound using the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2011-05-10 US disclosed
US-20090287025-A1 Fluorinating agent and method for producing fluorine-containing compound using the same SUMITOMO CHEMICAL COMPANY, LIMITED 2009-11-19 US disclosed
US-7569703-B2 Fluorinating agent and method for producing fluorine-containing compound using the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2009-08-04 US disclosed
US-20090012297-A1 Ionic liquids as solvents ENERGY, U.S. DEPARTMENT OF 2009-01-08 US disclosed
US-20070135634-A1 Fluorinating agent and method for producing fluorine-containing compound using the same SUMITOMO CHEMICAL COMPANY, LIMITED 2007-06-14 US disclosed
EP-1698606-A1 FLUORINATING AGENT AND METHOD FOR PRODUCING FLUORINE-CONTAINING COMPOUND USING SAME Sumitomo Chemical Company, Limited (JP) 2006-09-06 EP disclosed