SCHEMBL1896524

SCHEMBL1896524

NC(O)(O)C(O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Water SCHEMBL3815010 0.95
Bromide SCHEMBL9147965 0.95
Hydrochloric Acid SCHEMBL10812267 0.95
Fluoride SCHEMBL22982457 0.95
Silicate SCHEMBL8428154 0.82
SCHEMBL28709980 0.76
SCHEMBL11340906 0.76
SCHEMBL993048 0.73
SCHEMBL8034525 0.73
SCHEMBL5697121 0.70

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 53 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2605289-B1 TEXTURE-ETCHANT COMPOSITION FOR CRYSTALLINE SILICON WAFER AND METHOD FOR TEXTURE-ETCHING DONGWOO FINE CHEM CO LTD (KR) 2019-10-02 EP claimed
US-9305792-B2 Texture-etchant composition for crystalline silicon wafer and method for texture-etching (1) DONGWOO FINE-CHEM CO., LTD. (KR) 2016-04-05 US claimed
EP-2604724-B1 TEXTURE-ETCHANT COMPOSITION FOR CRYSTALLINE SILICON WAFER AND METHOD FOR TEXTURE-ETCHING (2) DONGWOO FINE CHEM CO LTD (KR) 2015-02-25 EP claimed
EP-2605289-A2 TEXTURE-ETCHANT COMPOSITION FOR CRYSTALLINE SILICON WAFER AND METHOD FOR TEXTURE-ETCHING (1) Dongwoo Fine-Chem Co., Ltd. (KR) 2013-06-19 EP claimed
EP-2604724-A2 TEXTURE-ETCHANT COMPOSITION FOR CRYSTALLINE SILICON WAFER AND METHOD FOR TEXTURE-ETCHING (2) Dongwoo Fine-Chem Co., Ltd. (KR) 2013-06-19 EP claimed
US-20130143403-A1 TEXTURE-ETCHANT COMPOSITION FOR CRYSTALLINE SILICON WAFER AND METHOD FOR TEXTURE-ETCHING (1) DONGWOO FINE-CHEM CO., LTD. (KR) 2013-06-06 US claimed
US-20130137278-A1 TEXTURE-ETCHANT COMPOSITION FOR CRYSTALLINE SILICON WAFER AND METHOD FOR TEXTURE-ETCHING (2) DONGWOO FINE-CHEM CO., LTD. (KR) 2013-05-30 US claimed
WO-2011052941-A2 ETCHING COMPOSITION FOR TEXTURING CRYSTALLINE SILICON-BASED WAFER DONGWOO FINE-CHEM CO., LTD. (KR) 2011-05-05 WO claimed
EP-0184506-B1 PROCESS FOR THE PREPARATION OF ALUMINA-BASED CATALYST SUPPORTS WITH IMPROVED DURABILITY RHONE-POULENC CHIMIE (FR) 1988-03-30 EP claimed
EP-0184506-A1 Process for the preparation of alumina-based catalyst supports with improved durability RHONE-POULENC CHIMIE (FR) 1986-06-11 EP claimed
WO-2024171892-A1 POLISHING COMPOSITION 株式会社フジミインコーポレーテッド 2024-08-22 WO disclosed
EP-3374463-B1 COOLANT CONCENTRATE CONTAINING SILICATE ROWE HOLDING GMBH (DE) 2023-03-01 EP disclosed
CN-107075347-B Polishing composition 福吉米株式会社 2020-03-20 CN disclosed
EP-2605289-B1 TEXTURE-ETCHANT COMPOSITION FOR CRYSTALLINE SILICON WAFER AND METHOD FOR TEXTURE-ETCHING DONGWOO FINE CHEM CO LTD (KR) 2019-10-02 EP disclosed
US-10190024-B2 Polishing composition FUJIMI INCORPORATED (JP) 2019-01-29 US disclosed
EP-0207857-A2 Composition containing ceric oxide, its preparation and its use RHONE-POULENC CHIMIE (FR) 1987-01-07 EP disclosed
EP-0184506-A1 Process for the preparation of alumina-based catalyst supports with improved durability RHONE-POULENC CHIMIE (FR) 1986-06-11 EP disclosed
US-4556629-A Developer composition for positive photoresists using solution with cyclic quaternary ammonium hydroxides MORTON THIOKOL, INC. (US) 1985-12-03 US disclosed
US-4253866-A HERBICIDE CIBA-GEIGY CORPORATION (US) 1981-03-03 US disclosed
US-4133675-A Pyridyloxy-phenoxy-alkanecarboxylic acid derivatives which are effective as herbicides and as agents regulating plant growth CIBA-GEIGY CORPORATION (US) 1979-01-09 US disclosed