SCHEMBL1898034

SCHEMBL1898034

CC(=O)NCC1CCCC(CNC(C)=O)C1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 2/20 0.44
MEN1 O00255 1/20 0.44
KMT2A Q03164 1/20 0.44
CACNA1H O95180 1/20 0.44
EPHX1 P07099 3/20 0.44
GSK3A P49840 1/20 0.41
GSK3B P49841 1/20 0.41
CA12 O43570 1/20 0.41
CA1 P00915 1/20 0.41
CA2 P00918 1/20 0.41
MMP1 P03956 1/20 0.41
MMP2 P08253 1/20 0.41
MMP3 P08254 1/20 0.41
MMP9 P14780 1/20 0.41
MMP8 P22894 1/20 0.41
CA9 Q16790 1/20 0.41
LMNA P02545 1/20 0.41
MAPT P10636 1/20 0.41
NPSR1 Q6W5P4 1/20 0.41
TDP1 Q9NUW8 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL20224596 0.94 NPC1 (0.41) NPC1MEN1KMT2ACACNA1HEPHX1
SCHEMBL20224593 0.94 NPC1 (0.41) NPC1MEN1KMT2ACACNA1HEPHX1
SCHEMBL4761490 0.92 NPC1 (0.40) NPC1MEN1KMT2ACACNA1HEPHX1
SCHEMBL5969117 0.91
SCHEMBL10147959 0.91 CYP2D6 (0.50) NPC1MEN1KMT2ACACNA1HEPHX1
SCHEMBL14039293 0.91 NPC1 (0.43) NPC1MEN1KMT2ACACNA1HEPHX1
SCHEMBL5968680 0.86 EPHX1 (0.57) NPC1KMT2ACACNA1HEPHX1CA12
SCHEMBL25009603 0.84 EPHX1 (0.61) NPC1KMT2AEPHX1CA12CA1
SCHEMBL885336 0.84 EPHX1 (0.61) NPC1KMT2AEPHX1CA12CA1
SCHEMBL20125204 0.84 EPHX1 (0.61) NPC1KMT2AEPHX1CA12CA1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12034115-B2 Solid electrolyte composition, sheet for all-solid state secondary battery, electrode sheet for all-solid state secondary battery, and all-solid state secondary battery FUJIFILM CORPORATION (JP) 2024-07-09 US disclosed
US-20240213479-A1 ELECTRODE COMPOSITION, ELECTRODE SHEET FOR ALL-SOLID STATE SECONDARY BATTERY, ALL-SOLID STATE SECONDARY BATTERY, AND MANUFACTURING METHODS FOR ELECTRODE COMPOSITION, ELECTRODE SHEET FOR ALL-SOLID STATE SECONDARY BATTERY, AND ALL-SOLID STATE SECONDARY BATTERY FUJIFILM CORPORATION (JP) 2024-06-27 US disclosed
US-20180149975-A1 NEGATIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION, NEGATIVE TYPE PLANOGRAPHIC PRINTING PLATE PRECURSOR, AND METHOD OF PREPARING PLANOGRAPHIC PRINTING PLATE FUJIFILM CORPORATION (JP) 2018-05-31 US disclosed
US-20170329225-A1 PHOTOSENSITIVE RESIN COMPOSITION, PLANOGRAPHIC PRINTING PLATE PRECURSOR, METHOD FOR PRODUCING PLANOGRAPHIC PRINTING PLATE, AND POLYMER COMPOUND FUJIFILM CORPORATION (JP) 2017-11-16 US disclosed
US-20170173938-A1 PHOTOSENSITIVE RESIN COMPOSITION, PLANOGRAPHIC PRINTING PLATE PRECURSOR, METHOD FOR PRODUCING PLANOGRAPHIC PRINTING PLATE, AND POLYMER COMPOUND FUJIFILM CORPORATION (JP) 2017-06-22 US disclosed
US-8829078-B2 Ink composition for inkjet recording, inkjet recording method and inkjet printed article FUJIFILM CORPORATION (JP) 2014-09-09 US disclosed
US-20130029268-A1 PHOTOSENSITIVE PLANOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD OF PRODUCING A PLANOGRAPHIC PRINTING PLATE FUJIFILM CORPORATION (JP) 2013-01-31 US disclosed
US-8318935-B2 Organic compounds 75074 NOVARTIS AG (CH) 2012-11-27 US disclosed
US-20120052257-A1 INK COMPOSITION FOR INKJET RECORDING, INKJET RECORDING METHOD AND INKJET PRINTED ARTICLE FUJIFILM CORPORATION (JP) 2012-03-01 US disclosed
EP-2332933-A1 Epithelial sodium channel (ENaC) inhibitors Novartis AG (CH) 2011-06-15 EP disclosed
EP-2325167-A1 METHOD FOR PRODUCING CARBAMATE COMPOUND Ube Industries, Ltd. (JP) 2011-05-25 EP disclosed
EP-2155721-B1 ORGANIC COMPOUNDS NOVARTIS AG (CH) 2011-02-23 EP disclosed
US-7718343-B2 Decomposable resin composition and pattern-forming material including the same FUJIFILM CORPORATION (JP) 2010-05-18 US disclosed
US-20080305292-A1 Antifouling material using hydroxyl group-containing acrylamide derivative and use thereof OKAZAKI KOUJU 2008-12-11 US disclosed
WO-2008135557-A1 ORGANIC COMPOUNDS NOVARTIS AG (CH) 2008-11-13 WO disclosed
US-20080199804-A1 Including free radical binder polymer containing functional group having dipole moment of 3.8 debye; laser computer controlled direct plate making without alkali development; sensitivity, printing durability FUJIFILM CORPORATION (JP) 2008-08-21 US disclosed
US-20080070154-A1 DECOMPOSABLE RESIN COMPOSITION AND PATTERN-FORMING MATERIAL INCLUDING THE SAME FUJIFILM CORPORATION (JP) 2008-03-20 US disclosed