SCHEMBL189912

SCHEMBL189912

CCN(N)CC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1794749 1.00
SCHEMBL28123087 0.95
SCHEMBL28066773 0.95
Ethane SCHEMBL3971999 0.95
Propane SCHEMBL4430157 0.95
Hydrochloric Acid SCHEMBL2778841 0.95
SCHEMBL27853946 0.95
Hydrochloric Acid SCHEMBL3853343 0.95
SCHEMBL28967859 0.95
Hydrochloric Acid SCHEMBL7343045 0.91

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1630 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250079156-A1 NITROGEN-BASED OXYGEN-FREE DIPOLES, RELATED DEVICES, RELATED SYSTEMS, AND RELATED METHODS ASM IP HOLDING B.V. (NL) 2025-03-06 US claimed
CN-118725998-B Ultra-fine circuit film stripping liquid and preparation method thereof 深圳市天熙科技开发有限公司 2025-02-11 CN claimed
CN-118725998-A Ultra-fine circuit film stripping liquid and preparation method thereof 深圳市天熙科技开发有限公司 2024-10-01 CN claimed
CN-118271558-A Improved preparation technology of high-purity alkyl hydrazine polyurethane material 东力(南通)化工有限公司 2024-07-02 CN claimed
CN-117205718-B Capturing and fixing CO2Composite material of (2), preparation method and CO2Absorption device 青岛理工大学 2024-05-14 CN claimed
CN-117205718-A Capturing and fixing CO 2 Composite material of (2), preparation method and CO 2 Absorption device 青岛理工大学 2023-12-12 CN claimed
CN-117071027-A Treatment fluid for forming foil and treatment method thereof 四川万邦电子科技有限公司 2023-11-17 CN claimed
CN-108987336-B Method for forming low temperature semiconductor layer and related semiconductor device structure ASM IP控股有限公司 2023-11-10 CN claimed
US-20230215728-A1 METHODS FOR FORMING A SEMICONDUCTOR STRUCTURE INCLUDING A DIPOLE LAYER ASM IP HOLDING B.V. (NL) 2023-07-06 US claimed
CN-114195675-B Method for preparing ethyl hydrazine by continuous flow of microreactor 东力(南通)化工有限公司 2023-02-28 CN claimed
US-5495031-A Process for the production of 7-(substituted)-9-[(substituted glycyl)amido]-6-demethyl-6-deoxytetracyclines AMERICAN CYANAMID COMPANY (US) 1996-02-27 US claimed
US-5466684-A 7-(substituted)-9-[(substituted glycyl)amido]-6-demethyl-6-deoxytetracyclines AMERICAN CYANAMID COMPANY (US) 1995-11-14 US claimed
US-5328902-A Antibiotics AMERICAN CYANAMID CO. (US) 1994-07-12 US claimed
EP-0582788-A1 7-(Substituted)-9- (substituted glycyl)-amido)-6-demethyl-6-deoxytetracyclines AMERICAN CYANAMID COMPANY (US) 1994-02-16 EP claimed
US-5272242-A Hydrazino/polyhydrosilazanes ATOCHEM (FR) 1993-12-21 US claimed
CN-1040380-A Preparation is by the application as the precursor of ceramic product of the method for the poly-hydrogen silazane of hydrazine derivative and described silazane ATOCHEM (FR) 1990-03-14 CN claimed
EP-0351262-A1 Polysilazanes, their preparation and use as precursors for ceramic materials, and the ceramic materials ELF ATOCHEM S.A. (FR) 1990-01-17 EP claimed
CN-1038655-A Polysilazane, its preparation method, and use it for ceramic precursor and make described pottery ATOCHEM (FR) 1990-01-10 CN claimed
EP-0327773-A1 Polysiloxazanes, process for producing same and their use as precursors for ceramics and ceramic materials ELF ATOCHEM S.A. (FR) 1989-08-16 EP claimed
US-4535154-A ONE-STEP USING POTASSIUM HYDROXIDE AND A NICKEL-ALUMINUM CATALYST UNITED STATES OF AMERICA (US) 1985-08-13 US claimed