⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1218994 | 1.00 | — | — | |
| SCHEMBL29188768 | 0.96 | — | — | |
| Butadiene SCHEMBL10338103 | 0.87 | — | — | |
| SCHEMBL14890997 | 0.74 | — | — | |
| SCHEMBL14890996 | 0.74 | — | — | |
| SCHEMBL8624892 | 0.69 | — | — | |
| SCHEMBL14891775 | 0.67 | — | — | |
| SCHEMBL2868041 | 0.67 | — | — | |
| SCHEMBL18807499 | 0.67 | — | — | |
| SCHEMBL2868040 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 36 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-106233436-B | Method for increasing etching rate of silicon etching process by etching chamber pretreatment | 国际商业机器公司 | 2020-01-07 | — | — | CN | disclosed |
| US-9711365-B2 | Etch rate enhancement for a silicon etch process through etch chamber pretreatment | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2017-07-18 | — | — | US | disclosed |
| US-20150318182-A1 | ETCH RATE ENHANCEMENT FOR A SILICON ETCH PROCESS THROUH ETCH CHAMBER PRETREATMENT | ZEON CORPORATION (JP) | 2015-11-05 | — | — | US | disclosed |
| US-8928124-B2 | High aspect ratio and reduced undercut trench etch process for a semiconductor substrate | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2015-01-06 | — | — | US | disclosed |
| US-8652969-B2 | High aspect ratio and reduced undercut trench etch process for a semiconductor substrate | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2014-02-18 | — | — | US | disclosed |
| US-20130328173-A1 | HIGH ASPECT RATIO AND REDUCED UNDERCUT TRENCH ETCH PROCESS FOR A SEMICONDUCTOR SUBSTRATE | ZEON CORPORATION (JP) | 2013-12-12 | — | — | US | disclosed |
| US-8535551-B2 | Plasma etching method | ZEON CORPORATION (JP) | 2013-09-17 | — | — | US | disclosed |
| US-20130105947-A1 | HIGH ASPECT RATIO AND REDUCED UNDERCUT TRENCH ETCH PROCESS FOR A SEMICONDUCTOR SUBSTRATE | ZEON CORPORATION (JP) | 2013-05-02 | — | — | US | disclosed |
| US-8404906-B2 | Process for producing 1,2,3,4-tetrachlorohexafluorobutane | SHOWA DENKO K.K. (JP) | 2013-03-26 | — | — | US | disclosed |
| US-20110112341-A1 | PROCESS FOR PRODUCING 1,2,3,4-TETRACHLOROHEXAFLUOROBUTANE | SHOWADENKO K.K. (JP) | 2011-05-12 | — | — | US | disclosed |
| EP-0190993-A2 | Perfluoroalkylsulfonoalkyl acrylates and methacrylates, process for their preparation and their use | CIBA-GEIGY AG (CH) | 1986-08-13 | — | — | EP | disclosed |
| EP-0181281-A1 | Fluoroalkylcarbamyl acrylates and methacrylates | CIBA-GEIGY AG (CH) | 1986-05-14 | — | — | EP | disclosed |
| EP-0177447-A1 | Diperfluoroalkyl carbamyl acrylates and methacrylates | CIBA-GEIGY AG (CH) | 1986-04-09 | — | — | EP | disclosed |
| EP-0083312-B1 | AQUEOUS BASED FIRE FOAM COMPOSITIONS CONTAINING HYDROCARBYL SULFIDE TERMINATED OLIGOMER STABILIZERS | CIBA-GEIGY AG (CH) | 1986-03-05 | — | — | EP | disclosed |
| EP-0019584-B1 | OLIGOMERS WITH PERFLUOR ALKYL END GROUPS THAT CONTAIN MERCAPTO GROUPS, PROCESS FOR THEIR PREPARATION AND THEIR USE AS SUFACE-ACTIVE SUBSTANCES AND AS ADDITIVES IN FIRE-EXTINGUISHING COMPOSITIONS | CIBA-GEIGY AG (CH) | 1984-11-14 | — | — | EP | disclosed |
| EP-0115253-A1 | Perfluoroalkyl substituted polymers | CIBA-GEIGY AG (CH) | 1984-08-08 | — | — | EP | disclosed |
| US-4460480-A | Protein hydrolyzate compositions for fire fighting containing perfluoroalkyl sulfide terminated oligomers | CIBA-GEIGY CORPORATION (US) | 1984-07-17 | — | — | US | disclosed |
| US-4439329-A | Aqueous based fire fighting foam compositions containing hydrocarbyl sulfide terminated oligomer stabilizers | CIBA-GEIGY CORPORATION (US) | 1984-03-27 | — | — | US | disclosed |
| EP-0083312-A1 | Aqueous based fire foam compositions containing hydrocarbyl sulfide terminated oligomer stabilizers | CIBA-GEIGY AG (CH) | 1983-07-06 | — | — | EP | disclosed |
| EP-0019584-A2 | Oligomers with perfluor alkyl end groups that contain mercapto groups, process for their preparation and their use as suface-active substances and as additives in fire-extinguishing compositions | CIBA-GEIGY AG (CH) | 1980-11-26 | — | — | EP | disclosed |