SCHEMBL190496

SCHEMBL190496

CCCCCC[Si](Br)(Br)Br

nearest known ligand 0.50

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.50
THRB P10828 1/20 0.50
DNM1 Q05193 7/20 0.38
ALDH1A1 P00352 3/20 0.38
LMNA P02545 2/20 0.38
MEN1 O00255 2/20 0.38
KMT2A Q03164 2/20 0.38
HSD17B10 Q99714 1/20 0.38
SLC22A1 O15245 1/20 0.38
EPHX1 P07099 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31286338 1.00 TSHR (0.50) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL3365431 1.00 TSHR (0.50) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL190705 1.00 TSHR (0.50) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL6259276 1.00 TSHR (0.50) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL190821 1.00 TSHR (0.50) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL4811578 0.97
SCHEMBL6046591 0.87 TSHR (0.38) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL6046590 0.87 TSHR (0.38) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL6046605 0.87 TSHR (0.38) TSHRTHRBDNM1ALDH1A1LMNA
SCHEMBL706965 0.87

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 231 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024232632-A1 TRANSITION METAL SUPPORTED CATALYST WITH IMPROVED HYDROGENATION ACTIVITY AND USE THEREOF 한양대학교 산학협력단 2024-11-14 WO claimed
US-8344238-B2 Self-cleaning protective coatings for use with photovoltaic cells SOLYNDRA LLC (US) 2013-01-01 US claimed
US-20110000539-A1 Self-cleaning protective coatings for use with photovoltaic cells SOLYNDRA, INC. (US) 2011-01-06 US claimed
US-20100326495-A1 Self-cleaning protective coatings for use with photovoltaic cells SOLYNDRA, INC. (US) 2010-12-30 US claimed
US-20070017567-A1 Self-cleaning protective coatings for use with photovoltaic cells BARNES, CHRISTOPHER 2007-01-25 US claimed
WO-2007012026-A1 SELF-CLEANING COATINGS SOLYNDRA, INC. (US) 2007-01-25 WO claimed
US-5017636-A Also containing polyisoprene, natural rubber, butadiene-styrene copolymer, wear and heat resistance, resilience JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1991-05-21 US claimed
WO-2024232632-A1 TRANSITION METAL SUPPORTED CATALYST WITH IMPROVED HYDROGENATION ACTIVITY AND USE THEREOF 한양대학교 산학협력단 2024-11-14 WO disclosed
WO-2022202119-A1 CURABLE COMPOSITION AND CURED OBJECT リンテック株式会社 2022-09-29 WO disclosed
CN-104974184-B preparation of silazane Compounds 信越化学工业株式会社 2019-12-06 CN disclosed
EP-2839968-B1 ORIGINAL PLATE FOR LITHOGRAPHIC PRINTING PLATE, AND METHOD FOR PRINTING SAME FUJIFILM CORP (JP) 2018-07-11 EP disclosed
EP-2930177-B1 PREPARATION OF SILAZANE COMPOUND SHINETSU CHEMICAL CO (JP) 2018-04-25 EP disclosed
EP-1356929-B2 Method of preparation of lithographic printing plates FUJIFILM CORP (JP) 2016-11-16 EP disclosed
EP-1008873-A1 Color filter and process for producing the same DAI NIPPON PRINTING CO., LTD. (JP) 2000-06-14 EP disclosed
US-6013372-A SELF-CLEANING, WEAR RESISTANT COATING TOTO, LTD. (JP) 2000-01-11 US disclosed
EP-0941839-A2 Radiant ray-sensitive lithographic printing plate precursor FUJI PHOTO FILM CO., LTD. (JP) 1999-09-15 EP disclosed
EP-0932081-A1 PATTERN FORMING BODY, PATTERN FORMING METHOD, AND THEIR APPLICATIONS DAI NIPPON PRINTING CO., LTD. (JP) 1999-07-28 EP disclosed
EP-0903389-A1 ANTIFOULING MEMBER AND ANTIFOULING COATING COMPOSITION TOTO LTD. (JP) 1999-03-24 EP disclosed
US-5755867-A DISPERSED IN CURABLE POLYSILOXANE FORMED BY HYDROLYSIS AND DEHYDRATION POLYCONDENSATION; WEATHER RESISTANT, ANTIFOGGING; AUTOMOBILE WINDSHIELDS SHIN-ETSU CHEMICAL CO., LTD. (JP) 1998-05-26 US disclosed
US-5017636-A Also containing polyisoprene, natural rubber, butadiene-styrene copolymer, wear and heat resistance, resilience JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1991-05-21 US disclosed