SCHEMBL1905741

SCHEMBL1905741

CC1COCC(C)O1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL346322 0.87 CHRM2 (0.43)
SCHEMBL13405270 0.78
SCHEMBL3510977 0.78
SCHEMBL3510979 0.78
SCHEMBL17150941 0.74 CHRM2 (0.39)
SCHEMBL28488495 0.74
SCHEMBL16037715 0.73
SCHEMBL343634 0.73
SCHEMBL10525 0.70
SCHEMBL5945097 0.70

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 177 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1628320-B1 Barrier rib formation composition for manufacturing plasma display panel LG ELECTRONICS INC (KR) 2010-03-03 EP claimed
US-7442738-B2 Barrier rib formation composition for manufacturing plasma display panel LG ELECTRONICS INC. (KR) 2008-10-28 US claimed
EP-1628320-A1 Barrier rib formation composition for manufacturing plasma display panel LG Electronics Inc. (KR) 2006-02-22 EP claimed
US-20060020050-A1 Barrier rib formation composition for manufacturing plasma display panel LG ELECTRONICS INC. 2006-01-26 US claimed
JP-10316997-A None JP disclosed
EP-3753991-B1 AQUEOUS COATING MATERIAL COMPOSITION TOYO SEIKAN GROUP HOLDINGS LTD (JP) 2024-03-06 EP disclosed
CN-117157281-A Targeted delivery of 1,2,4, 5-tetraoxacompounds and uses thereof 西湖大学 2023-12-01 CN disclosed
US-20230261264-A1 ELECTROCHEMICAL DEVICE AND ELECTRONIC DEVICE CONTAINING SAME NINGDE AMPEREX TECHNOLOGY LIMITED (CN) 2023-08-17 US disclosed
US-20230261264-A1 ELECTROCHEMICAL DEVICE AND ELECTRONIC DEVICE CONTAINING SAME NINGDE AMPEREX TECHNOLOGY LIMITED (CN) 2023-08-17 US disclosed
US-20230219191-A1 POLISHING PAD, CHEMICAL MECHANICAL POLISHING APPARATUS INCLUDING THE SAME, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 2023-07-13 US disclosed
US-20230211456-A1 POLISHING PAD FOR CHEMICAL MECHANICAL POLISHING, CHEMICAL MECHANICAL POLISHING APPARATUS INLUDING THE SAME, AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE CHEMICAL MECHANICAL POLISHING APPARATUS SAMSUNG ELECTRONICS CO., LTD. (KR) 2023-07-06 US disclosed
US-20210079255-A1 AQUEOUS COATING COMPOSITION TOYO SEIKAN GROUP HOLDINGS, LTD. (JP) 2021-03-18 US disclosed
WO-2002102793-A2 QUINAZOLINEDIONES AS ANTIBACTERIAL AGENTS WARNER-LAMBERT COMPANY LLC (US) 2002-12-27 WO disclosed
WO-2002096908-A1 ANTIBACTERIAL AGENTS WARNER-LAMBERT COMPANY LLC (US) 2002-12-05 WO disclosed
EP-1255739-A1 3-AMINOQUINAZOLIN-2,4-DIONE ANTIBACTERIAL AGENTS WARNER-LAMBERT COMPANY (US) 2002-11-13 EP disclosed
WO-2002051385-A1 SOLID DISPERSIONS OF NITRATE ACTIVE PRINCIPLES NICOX S.A. (FR) 2002-07-04 WO disclosed
WO-2001053273-A1 3-AMINOQUINAZOLIN-2,4-DIONE ANTIBACTERIAL AGENTS WARNER-LAMBERT COMPANY (US) 2001-07-26 WO disclosed
JP-H10316997-A METHOD FOR CLEANING RESIDUE ADHERED TO INDUSTRIAL DEVICE MITSUBISHI RAYON CO LTD 1998-12-02 JP disclosed
US-5202463-A Distilling with controlled amount of azeotroping agent to remove water and by-products ARCO CHEMICAL TECHNOLOGY, L.P. (US) 1993-04-13 US disclosed
US-4336195-A Preparation of cyclic ethers THE DOW CHEMICAL COMPANY (US) 1982-06-22 US disclosed