⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6047823 | 0.87 | — | — | |
| SCHEMBL17138303 | 0.81 | — | — | |
| SCHEMBL6330541 | 0.80 | — | — | |
| SCHEMBL6327099 | 0.80 | — | — | |
| SCHEMBL17138343 | 0.75 | — | — | |
| SCHEMBL1051033 | 0.72 | — | — | |
| SCHEMBL1225495 | 0.69 | — | — | |
| SCHEMBL6330548 | 0.69 | — | — | |
| SCHEMBL3147870 | 0.69 | — | — | |
| SCHEMBL6324956 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 205 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8344238-B2 | Self-cleaning protective coatings for use with photovoltaic cells | SOLYNDRA LLC (US) | 2013-01-01 | — | — | US | claimed |
| US-20110000539-A1 | Self-cleaning protective coatings for use with photovoltaic cells | SOLYNDRA, INC. (US) | 2011-01-06 | — | — | US | claimed |
| US-20100326495-A1 | Self-cleaning protective coatings for use with photovoltaic cells | SOLYNDRA, INC. (US) | 2010-12-30 | — | — | US | claimed |
| WO-2007012026-A1 | SELF-CLEANING COATINGS | SOLYNDRA, INC. (US) | 2007-01-25 | — | — | WO | claimed |
| US-20070017567-A1 | Self-cleaning protective coatings for use with photovoltaic cells | BARNES, CHRISTOPHER | 2007-01-25 | — | — | US | claimed |
| CN-104974184-B | preparation of silazane Compounds | 信越化学工业株式会社 | 2019-12-06 | — | — | CN | disclosed |
| EP-2839968-B1 | ORIGINAL PLATE FOR LITHOGRAPHIC PRINTING PLATE, AND METHOD FOR PRINTING SAME | FUJIFILM CORP (JP) | 2018-07-11 | — | — | EP | disclosed |
| EP-2930177-B1 | PREPARATION OF SILAZANE COMPOUND | SHINETSU CHEMICAL CO (JP) | 2018-04-25 | — | — | EP | disclosed |
| EP-1356929-B2 | Method of preparation of lithographic printing plates | FUJIFILM CORP (JP) | 2016-11-16 | — | — | EP | disclosed |
| US-9416147-B2 | Preparation of silazane compound | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-08-16 | — | — | US | disclosed |
| EP-2930177-A1 | Preparation of silazane compound | Shin-Etsu Chemical Co., Ltd. (JP) | 2015-10-14 | — | — | EP | disclosed |
| US-20150284414-A1 | PREPARATION OF SILAZANE COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-10-08 | — | — | US | disclosed |
| EP-1057622-A2 | Lithographic printing plate precursor and method for producing the same | FUJI PHOTO FILM CO., LTD. (JP) | 2000-12-06 | — | — | EP | disclosed |
| EP-1038666-A2 | Lithographic printing plate precursor | FUJI PHOTO FILM CO., LTD. (JP) | 2000-09-27 | — | — | EP | disclosed |
| EP-1008873-A1 | Color filter and process for producing the same | DAI NIPPON PRINTING CO., LTD. (JP) | 2000-06-14 | — | — | EP | disclosed |
| US-6013372-A | SELF-CLEANING, WEAR RESISTANT COATING | TOTO, LTD. (JP) | 2000-01-11 | — | — | US | disclosed |
| EP-0941839-A2 | Radiant ray-sensitive lithographic printing plate precursor | FUJI PHOTO FILM CO., LTD. (JP) | 1999-09-15 | — | — | EP | disclosed |
| EP-0932081-A1 | PATTERN FORMING BODY, PATTERN FORMING METHOD, AND THEIR APPLICATIONS | DAI NIPPON PRINTING CO., LTD. (JP) | 1999-07-28 | — | — | EP | disclosed |
| EP-0903389-A1 | ANTIFOULING MEMBER AND ANTIFOULING COATING COMPOSITION | TOTO LTD. (JP) | 1999-03-24 | — | — | EP | disclosed |
| US-5755867-A | DISPERSED IN CURABLE POLYSILOXANE FORMED BY HYDROLYSIS AND DEHYDRATION POLYCONDENSATION; WEATHER RESISTANT, ANTIFOGGING; AUTOMOBILE WINDSHIELDS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1998-05-26 | — | — | US | disclosed |