⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4428410 | 0.89 | — | — | |
| SCHEMBL4287102 | 0.89 | — | — | |
| SCHEMBL4290452 | 0.85 | — | — | |
| SCHEMBL26443836 | 0.85 | — | — | |
| SCHEMBL18053519 | 0.84 | — | — | |
| SCHEMBL704271 | 0.84 | — | — | |
| SCHEMBL703372 | 0.84 | — | — | |
| SCHEMBL6289792 | 0.83 | — | — | |
| SCHEMBL26443841 | 0.80 | — | — | |
| SCHEMBL6536721 | 0.79 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 275 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4640204-A2 | HAIR COSMETIC COMPOSITION | Kao Corporation (JP) | 2025-10-29 | — | — | EP | claimed |
| EP-3831362-B1 | HAIR COSMETIC COMPOSITION | KAO CORP (JP) | 2025-10-15 | — | — | EP | claimed |
| US-20240130956-A1 | HAIR COSMETIC COMPOSITION | KAO CORPORATION (JP) | 2024-04-25 | — | — | US | claimed |
| CN-112512498-B | Hair cosmetic | 花王株式会社 | 2023-09-12 | — | — | CN | claimed |
| CN-114867462-A | Hair cosmetic | 花王株式会社 | 2022-08-05 | — | — | CN | claimed |
| WO-2021131939-A1 | HAIR COSMETIC COMPOSITION | 花王株式会社 | 2021-07-01 | — | — | WO | claimed |
| EP-3831362-A1 | HAIR COSMETIC COMPOSITION | Kao Corporation (JP) | 2021-06-09 | — | — | EP | claimed |
| US-20210154129-A1 | HAIR COSMETIC COMPOSITION | KAO CORPORATION (JP) | 2021-05-27 | — | — | US | claimed |
| CN-112512498-A | Hair cosmetic | 花王株式会社 | 2021-03-16 | — | — | CN | claimed |
| WO-2020022488-A1 | HAIR COSMETIC COMPOSITION | 花王株式会社 | 2020-01-30 | — | — | WO | claimed |
| US-8344238-B2 | Self-cleaning protective coatings for use with photovoltaic cells | SOLYNDRA LLC (US) | 2013-01-01 | — | — | US | claimed |
| US-20110000539-A1 | Self-cleaning protective coatings for use with photovoltaic cells | SOLYNDRA, INC. (US) | 2011-01-06 | — | — | US | claimed |
| US-20100326495-A1 | Self-cleaning protective coatings for use with photovoltaic cells | SOLYNDRA, INC. (US) | 2010-12-30 | — | — | US | claimed |
| US-20070017567-A1 | Self-cleaning protective coatings for use with photovoltaic cells | BARNES, CHRISTOPHER | 2007-01-25 | — | — | US | claimed |
| WO-2007012026-A1 | SELF-CLEANING COATINGS | SOLYNDRA, INC. (US) | 2007-01-25 | — | — | WO | claimed |
| EP-4640204-A2 | HAIR COSMETIC COMPOSITION | Kao Corporation (JP) | 2025-10-29 | — | — | EP | disclosed |
| EP-3831362-B1 | HAIR COSMETIC COMPOSITION | KAO CORP (JP) | 2025-10-15 | — | — | EP | disclosed |
| EP-0816466-A1 | METHOD OF PHOTOCATALYTICALLY MAKING THE SURFACE OF BASE MATERIAL ULTRAHYDROPHILIC, BASE MATERIAL HAVING ULTRAHYDROPHILIC AND PHOTOCATALYTIC SURFACE, AND PROCESS FOR PRODUCING SAID MATERIAL | TOTO LTD. (JP) | 1998-01-07 | — | — | EP | disclosed |
| US-5371164-A | Blend with a polysilazane | TOSHIBA SILICONE CO., LTD. (JP) | 1994-12-06 | — | — | US | disclosed |
| EP-0591622-A1 | Room-temperature curable polyorganosiloxane composition | TOSHIBA SILICONE CO., LTD. (JP) | 1994-04-13 | — | — | EP | disclosed |