SCHEMBL191579

SCHEMBL191579

Br[SiH](Br)Br

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL332678 0.61
SCHEMBL331166 0.61
SCHEMBL11895157 0.61
Lithium SCHEMBL29370568 0.50
SCHEMBL5417542 0.50
Lithium SCHEMBL1520 0.50
Lithium SCHEMBL5345609 0.50
Lithium SCHEMBL29349429 0.50
SCHEMBL11320683 0.50
Lithium SCHEMBL29350999 0.50

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 575 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4748968-A1 METHOD FOR FORMING THIN FILM USING TWO TYPES OF SILICON PRECURSOR COMPOUNDS Hansol Chemical Co., Ltd (KR) 2026-05-27 EP claimed
US-20260011722-A1 Production Process for a Porous Host Structure Containing Silicon Oxide as an Anode Active Material for a Lithium Battery HONEYCOMB BATTERY COMPANY (US) 2026-01-08 US claimed
EP-4667616-A1 METHOD FOR THE FORMATION OF THIN FILMS USING TWO TYPES OF SILICON PRECURSOR Hansol Chemical Co., Ltd (KR) 2025-12-24 EP claimed
US-20250382184-A1 A Negative Electrode Active Material and a Preparation Method thereof SHANGHAI SHANSHAN TECH CO LTD (CN) 2025-12-18 US claimed
US-20250369114-A1 METHOD FOR THE FORMATION OF THIN FILMS USING TWO TYPES OF SILICON PRECURSOR HANSOL CHEMICAL CO LTD (KR) 2025-12-04 US claimed
US-12463041-B2 Method and apparatus for forming ruthenium silicide film on surface of substrate TOKYO ELECTRON LIMITED (JP) 2025-11-04 US claimed
WO-2025226985-A1 PASSIVATION OF POLYSILICON MATERIAL AND SELECTIVE DEPOSITION OF DIELECTRIC MATERIAL UTILIZING ALKYNES VERSUM MATERIALS US, LLC (US) 2025-10-30 WO claimed
US-12431354-B2 Silicon nitride and silicon oxide deposition methods using fluorine inhibitor ASM IP HOLDING B.V. (NL) 2025-09-30 US claimed
US-20250300172-A1 Process for Producing Porous Host Structure Containing Silicon as an Anode Active Material for a Lithium Battery HONEYCOMB BATTERY COMPANY (US) 2025-09-25 US claimed
EP-4585715-A1 COMPOSITION FOR DEPOSITING A MOLYBDENUM-CONTAINING THIN FILM, METHOD FOR MANUFACTURING A MOLYBDENUM-CONTAINING THIN FILM, AND MOLYBDENUM-CONTAINING THIN FILM MANUFACTURED THEREBY Samsung Electronics Co., Ltd. (KR) 2025-07-16 EP claimed
US-20220319833-A1 METHOD AND SYSTEM FOR MITIGATING UNDERLAYER DAMAGE DURING FORMATION OF PATTERNED STRUCTURES ASM IP HOLDING B.V. (NL) 2022-10-06 US claimed
US-20220287949-A1 SAFE PARTICLES FOR THE INTRODUCTION OF USEFUL CHEMICAL AGENTS IN THE BODY WITH CONTROLLED ACTIVATION BAMBU VAULT LLC (US) 2022-09-15 US claimed
WO-2022187616-A1 REAGENTS TO REMOVE OXYGEN FROM METAL OXYHALIDE PRECURSORS IN THIN FILM DEPOSITION PROCESSES L'AIR LIQUIDE SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) 2022-09-09 WO claimed
CN-113957417-A CVD fluidized deposition device and preparation method of silicon-carbon negative electrode material 长沙矿冶研究院有限责任公司 2022-01-21 CN claimed
CN-113966348-A Security particles with controlled activation for introducing useful chemical agents into the body 班布沃尔特有限公司 2022-01-21 CN claimed
CN-113233994-A Alpha-diimine compound with multiple hydroxyl groups, complex, load and application thereof 河北工业大学 2021-08-10 CN claimed
CN-113185415-A Aromatic amine with multiple hydroxyl groups and pyridine diimine compound, complex and load thereof 河北工业大学 2021-07-30 CN claimed
US-6492476-B1 COMPOUNDS WHICH CONSISTS OF A RARE EARTH METAL COMPOUND, AN ORGANIC ALUMINUM COMPOUND AND A TRIHALOSILANE, OF A PROCESS FOR THE PRODUCTION THEREOF AND OF THE USE OF THE CATALYST FOR POLYMERIZING CONJUGATED DIENES TO FORM HIGH MOLECULAR WEIGHT BAYER AKTIENGESELLSCHAFT (DE) 2002-12-10 US claimed
EP-1025145-A1 MEANS AND METHODS FOR ENHANCING INTERFACIAL ADHESION BETWEEN A METAL SURFACE AND A NON-METALLIC MEDIUM AND PRODUCTS OBTAINED THEREBY N.V. BEKAERT S.A. (BE) 2000-08-09 EP claimed
WO-1999020682-A1 MEANS AND METHODS FOR ENHANCING INTERFACIAL ADHESION BETWEEN A METAL SURFACE AND A NON-METALLIC MEDIUM AND PRODUCTS OBTAINED THEREBY N.V. BEKAERT S.A. (BE) 1999-04-29 WO claimed