SCHEMBL19206658

SCHEMBL19206658

CC(C)=C(C(=O)O)C(C)(C)C.OCC(CO)(CO)CO.OCC(CO)(CO)CO

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29505156 0.85 FFAR3 (0.35)
Pivalate SCHEMBL27654793 0.75 TSHR (0.42)
Acetic Acid SCHEMBL2578973 0.74 FFAR3 (0.50)
Acetic Acid SCHEMBL28959399 0.74 FFAR3 (0.50)
Acetic Acid SCHEMBL11544701 0.74 FFAR3 (0.50)
Acetic Acid SCHEMBL832778 0.74 FFAR3 (0.50)
Acetic Acid SCHEMBL813642 0.74 FFAR3 (0.50)
Acetic Acid SCHEMBL309352 0.74 FFAR3 (0.50)
Acetic Acid SCHEMBL10338273 0.74 FFAR3 (0.50)
Acetic Acid SCHEMBL725625 0.74 FFAR3 (0.50)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104854509-B Coating liquid for forming inorganic oxide coating film, and display device 日产化学工业株式会社 2021-04-13 CN disclosed
CN-111448517-A Adhesive resin and photosensitive resin composition or coating solution containing the same 塔科马科技有限公司 2020-07-24 CN disclosed
US-10591816-B2 Photosensitive resin composition, color filter, and liquid crystal display element thereof CHI MEI CORPORATION (TW) 2020-03-17 US disclosed
US-20170235224-A1 PHOTOSENSITIVE RESIN COMPOSITION, COLOR FILTER, AND LIQUID CRYSTAL DISPLAY ELEMENT THEREOF CHI MEI CORPORATION (TW) 2017-08-17 US disclosed