⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12650647 | 1.00 | — | — | |
| SCHEMBL26008896 | 0.94 | — | — | |
| SCHEMBL12019099 | 0.92 | — | — | |
| SCHEMBL12650602 | 0.92 | — | — | |
| SCHEMBL25636451 | 0.89 | — | — | |
| SCHEMBL18826768 | 0.89 | — | — | |
| SCHEMBL12019126 | 0.89 | — | — | |
| SCHEMBL12017766 | 0.89 | — | — | |
| SCHEMBL26807899 | 0.89 | — | — | |
| SCHEMBL13482575 | 0.88 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9971241-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-05-15 | — | — | US | disclosed |
| US-9726974-B2 | Resin, photoresist composition, and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-08-08 | — | — | US | disclosed |