⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10846551 | 0.87 | — | — | |
| SCHEMBL8203672 | 0.82 | — | — | |
| SCHEMBL10948761 | 0.82 | — | — | |
| SCHEMBL8724001 | 0.82 | — | — | |
| SCHEMBL9623134 | 0.82 | — | — | |
| SCHEMBL2179 | 0.82 | — | — | |
| SCHEMBL5193510 | 0.82 | — | — | |
| SCHEMBL9998309 | 0.82 | — | — | |
| SCHEMBL93246 | 0.82 | — | — | |
| SCHEMBL5867087 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2053463-A1 | Detection of contamination in EUV systems | Interuniversitair Microelektronica Centrum (BE) | 2009-04-29 | — | — | EP | claimed |
| CN-104198060-B | High temperature-resistant wireless MEMS temperature sensing system | 清华大学 | 2017-01-18 | — | — | CN | disclosed |
| EP-2487148-B1 | CYCLIC COMPOUND, METHOD FOR PRODUCING SAME, RADIATION SENSITIVE COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN | MITSUBISHI GAS CHEMICAL CO (JP) | 2014-12-31 | — | — | EP | disclosed |
| US-8829247-B2 | Cyclic compound, method of producing the same, radiation sensitive composition, and method of forming resist pattern | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2014-09-09 | — | — | US | disclosed |
| US-20120251947-A1 | CYCLIC COMPOUND, METHOD OF PRODUCING THE SAME, RADIATION SENSITIVE COMPOSITION, AND METHOD OF FORMING RESIST PATTERN | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2012-10-04 | — | — | US | disclosed |
| EP-2487148-A1 | CYCLIC COMPOUND, METHOD FOR PRODUCING SAME, RADIATION SENSITIVE COMPOSITION, AND METHOD FOR FORMING RESIST PATTERN | Mitsubishi Gas Chemical Company, Inc. (JP) | 2012-08-15 | — | — | EP | disclosed |
| EP-2053463-B1 | Detection of contamination in EUV systems | IMEC (BE) | 2011-06-08 | — | — | EP | disclosed |
| EP-2053463-A1 | Detection of contamination in EUV systems | Interuniversitair Microelektronica Centrum (BE) | 2009-04-29 | — | — | EP | disclosed |