⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1925950 | 0.86 | — | — | |
| SCHEMBL1925408 | 0.83 | — | — | |
| SCHEMBL1926502 | 0.71 | — | — | |
| SCHEMBL1925548 | 0.69 | — | — | |
| SCHEMBL1924883 | 0.60 | NPC1 (0.30) | — | |
| SCHEMBL1924381 | 0.59 | — | — | |
| SCHEMBL1926991 | 0.59 | — | — | |
| SCHEMBL2955499 | 0.59 | CYP3A4 (0.47) | — | |
| SCHEMBL2952017 | 0.59 | CYP3A4 (0.42) | — | |
| SCHEMBL1925212 | 0.58 | HRH3 (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8592606-B2 | Liquid precursor for depositing group 4 metal containing films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2013-11-26 | — | — | US | disclosed |
| EP-2330109-B1 | Liquid precursor for depositing group 4 metal containing films | AIR PROD & CHEM (US) | 2013-01-16 | — | — | EP | disclosed |
| US-20110135838-A1 | Liquid Precursor for Depositing Group 4 Metal Containing Films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2011-06-09 | — | — | US | disclosed |
| EP-2330109-A1 | Liquid precursor for depositing group 4 metal containing films | AIR PRODUCTS AND CHEMICALS, INC. (US) | 2011-06-08 | — | — | EP | disclosed |