SCHEMBL19261069

SCHEMBL19261069

CCC(C)(I)C(=O)OC1(C2CCCC2)CCCC1

nearest known ligand 0.33

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 2/20 0.33
ABCB11 O95342 1/20 0.33
LMNA P02545 1/20 0.33
CYP1A2 P05177 1/20 0.33
CHRM2 P08172 1/20 0.33
CHRM4 P08173 1/20 0.33
CHRM5 P08912 1/20 0.33
CYP2D6 P10635 1/20 0.33
CHRM1 P11229 1/20 0.33
CYP2C9 P11712 1/20 0.33
TSHR P16473 1/20 0.33
CHRM3 P20309 1/20 0.33
DRD1 P21728 1/20 0.33
HRH2 P25021 1/20 0.33
HTR2A P28223 1/20 0.33
HTR2C P28335 1/20 0.33
HRH1 P35367 1/20 0.33
DRD3 P35462 1/20 0.33
SCN1A P35498 1/20 0.33
THPO P40225 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19261074 0.98 CYP3A4 (0.35) CYP3A4ABCB11LMNACYP1A2CHRM2
SCHEMBL19261071 0.98 CYP3A4 (0.35) CYP3A4ABCB11LMNACYP1A2CHRM2
SCHEMBL19261076 0.98 CYP3A4 (0.35) CYP3A4ABCB11LMNACYP1A2CHRM2
SCHEMBL6367137 0.84 CYP3A4 (0.35) CYP3A4ABCB11LMNACYP1A2CHRM2
SCHEMBL6367207 0.83 CYP3A4 (0.37) CYP3A4ABCB11LMNACYP1A2CHRM2
SCHEMBL6367219 0.83 CYP3A4 (0.37) CYP3A4ABCB11LMNACYP1A2CHRM2
SCHEMBL6367212 0.83 CYP3A4 (0.37) CYP3A4ABCB11LMNACYP1A2CHRM2
SCHEMBL22200959 0.80 CYP3A4 (0.32) CYP3A4ABCB11LMNACYP1A2CHRM2
SCHEMBL12014444 0.80 HMGCR (0.32) CYP3A4ABCB11LMNACYP1A2CHRM2
SCHEMBL19261202 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9989847-B2 Onium salt compound, resist composition, and pattern forming process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-06-05 US disclosed
US-9740100-B2 Hemiacetal compound, polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-08-22 US disclosed