⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1930457 | 1.00 | — | — | |
| SCHEMBL11124966 | 0.79 | — | — | |
| SCHEMBL13077572 | 0.72 | — | — | |
| SCHEMBL9349690 | 0.70 | — | — | |
| SCHEMBL14944918 | 0.69 | — | — | |
| SCHEMBL12533091 | 0.69 | — | — | |
| SCHEMBL19057711 | 0.69 | — | — | |
| SCHEMBL2192 | 0.67 | — | — | |
| SCHEMBL5787771 | 0.67 | — | — | |
| Hydrogen Sulfide SCHEMBL2510222 | 0.64 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1854553-B1 | Electronic device substrate, method for manufacturing substrate | SEIKO EPSON CORP (JP) | 2014-11-05 | — | — | EP | disclosed |
| US-7955705-B2 | Electronic device substrate, method for manufacturing substrate, compound used for substrate, method for manufacturing compound and polymerization initiator including compound | SEIKO EPSON CORPORATION (JP) | 2011-06-07 | — | — | US | disclosed |
| EP-1854553-A1 | Electronic device substrate, method for manufacturing substrate, compound used for substrate, method for manufacturing compound and polymerization initiator including compound | SEIKO EPSON CORPORATION (JP) | 2007-11-14 | — | — | EP | disclosed |
| US-20070259187-A1 | ELECTRONIC DEVICE SUBSTRATE, METHOD FOR MANUFACTURING SUBSTRATE, COMPOUND USED FOR SUBSTRATE, METHOD FOR MANUFACTURING COMPOUND AND POLYMERIZATION INITIATOR INCLUDING COMPOUND | SEIKO EPSON CORPORATION (JP) | 2007-11-08 | — | — | US | disclosed |