Trimethylammonium

Trimethylammonium

SCHEMBL1933277

CN(C)C.O=COCCO

nearest known ligand 0.32

Full drug profile on Sugi Atlas →

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.32
TSHR P16473 2/20 0.32
MAPK1 P28482 1/20 0.32
MEN1 O00255 1/20 0.30
KMT2A Q03164 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methyl Alcohol SCHEMBL11715926 0.89
SCHEMBL122385 0.89
SCHEMBL5998956 0.86
Ethylene Glycol SCHEMBL27450304 0.86 TSHR (0.37) ALDH1A1TSHRMAPK1MEN1KMT2A
Water SCHEMBL10456346 0.86
Ammonia Solution, Strong SCHEMBL6291895 0.86
Trimethylammonium SCHEMBL5147185 0.85
Trimethylammonium SCHEMBL27775262 0.83
Propene SCHEMBL10456640 0.82 TSHR (0.39) ALDH1A1TSHRMAPK1
Propene SCHEMBL8467543 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119816784-A Fabrication of integrated circuits using positive photo-patternable dielectrics comprising high silicon content polysilsesquioxanes 潍坊星泰克微电子材料有限公司 2025-04-11 CN disclosed
EP-4508495-A1 MANUFACTURE OF INTEGRATED CIRUIT USING POSITIVE TONE PHOTOPATTERNABLE DIELECTRIC INCLUDING HIGH SILICON CONTENT POLYSILSESQUIOXANE Suntific Materials (Weifang), Ltd. (CN) 2025-02-19 EP disclosed
WO-2025000535-A1 MANUFACTURE OF INTEGRATED CIRUIT USING POSITIVE TONE PHOTOPATTERNABLE DIELECTRIC INCLUDING HIGH SILICON CONTENT POLYSILSESQUIOXANE SUNTIFIC MATERIALS (WEIFANG), LTD. (CN) 2025-01-02 WO disclosed
CN-111133557-B Thermally removable filler material for anti-stiction applications 霍尼韦尔国际公司 2023-11-24 CN disclosed
CN-106065278-B Polysiloxane compositions and coatings for optoelectronic applications 霍尼韦尔国际公司 2021-08-10 CN disclosed
CN-111133557-A Thermally removable fill material for anti-stiction applications 霍尼韦尔国际公司 2020-05-08 CN disclosed
EP-2074157-B1 VISCOELASTIC FOAMS HAVING HIGH AIR FLOW DOW GLOBAL TECHNOLOGIES LLC (US) 2017-02-01 EP disclosed
US-8791168-B2 Viscoelastic foams having high air flow DOW GLOBAL TECHNOLOGIES (US) 2014-07-29 US disclosed
US-20110136930-A1 METHOD FOR PREPARING VISCOELASTIC POLYURETHANE FOAM Dow Global Technologies LLC (Formerly known as Dow Global Technologies Inc.) (US) 2011-06-09 US disclosed
US-20090306237-A1 VISCOELASTIC FOAMS HAVING HIGH AIR FLOW DOW GLOBAL TECHNOLOGIES INC. (US) 2009-12-10 US disclosed
US-20090292037-A1 METHOD FOR PREPARING VISCOELASTIC POLYURETHANE FOAM BUTLER DENISE R 2009-11-26 US disclosed
US-7566686-B2 Shale inhibition additive for oil/gas down hole fluids and methods for making and using same CLEARWATER INTERNATIONAL, LLC (US) 2009-07-28 US disclosed
EP-2074157-A1 VISCOELASTIC FOAMS HAVING HIGH AIR FLOW Dow Global Technologies Inc. (US) 2009-07-01 EP disclosed
EP-2052005-A2 METHOD FOR PREPARING VISCOELASTIC POLYURETHANE FOAM Dow Global Technologies Inc. (US) 2009-04-29 EP disclosed
WO-2008036173-A1 VISCOELASTIC FOAMS HAVING HIGH AIR FLOW DOW GLOBAL TECHNOLOGIES INC. (US) 2008-03-27 WO disclosed
WO-2008021034-A2 METHOD FOR PREPARING VISCOELASTIC POLYURETHANE FOAM DOW GLOBAL TECHNOLOGIES, INC. (US) 2008-02-21 WO disclosed
US-20080039345-A1 Shale inhibition additive for oil/gas down hole fluids and methods for making and using same CLEARWATER INTERNATIONAL, L.L.C. 2008-02-14 US disclosed
US-7268100-B2 Shale inhibition additive for oil/gas down hole fluids and methods for making and using same CLEARWATER INTERNATIONAL, LLC (US) 2007-09-11 US disclosed
US-20060116296-A1 Shale Inhibition additive for oil/gas down hole fluids and methods for making and using same CLEARWATER INTERNATIONAL, L.L.C. 2006-06-01 US disclosed