SCHEMBL19335327

SCHEMBL19335327

CC(C)(C)C(=O)OCCC1CC2CC1CC2CC(O)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23963451 0.80 TSHR (0.36) —
SCHEMBL22853269 0.80 — —
SCHEMBL22516937 0.75 — —
SCHEMBL18791205 0.74 TSHR (0.38) —
SCHEMBL19335325 0.74 — —
SCHEMBL18476617 0.73 — —
SCHEMBL18697266 0.72 — —
SCHEMBL14505664 0.71 — —
SCHEMBL9608729 0.71 — —
SCHEMBL18457101 0.71 — —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11208509-B2 Polymer compound for conductive polymer and method for producing same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-12-28 — — US disclosed
US-20200291145-A1 POLYMER COMPOUND FOR CONDUCTIVE POLYMER AND METHOD FOR PRODUCING SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-09-17 — — US disclosed
US-9760010-B2 Patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-09-12 — — US disclosed
Send feedback