SCHEMBL19335474

SCHEMBL19335474

CCc1ccc(OC(=O)C(C)(C)C)cc1O

nearest known ligand 0.56

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
ELANE P08246 13/20 0.54
CA2 P00918 4/20 0.45
HTR1D P28221 1/20 0.44
HTR1B P28222 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19335346 0.87 ELANE (0.53) ELANECA2HTR1DHTR1B
SCHEMBL10591054 0.82 CYP3A4 (0.56) ELANE
SCHEMBL8408131 0.82 ELANE (0.47) ELANECA2
SCHEMBL8406455 0.81 ELANE (0.48) ELANE
SCHEMBL18826237 0.80 ELANE (0.49) ELANECA2HTR1DHTR1B
SCHEMBL18826349 0.79 ELANE (0.63) ELANECA2
SCHEMBL19335353 0.79 ELANE (0.57) ELANECA2
SCHEMBL19454183 0.79 ELANE (0.41) ELANECA2HTR1DHTR1B
SCHEMBL19335493 0.78 ELANE (0.55) ELANECA2
SCHEMBL8403640 0.78 ELANE (0.81) ELANE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10007178-B2 Positive resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-06-26 US disclosed
US-9760010-B2 Patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-09-12 US disclosed