⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14118908 | 0.93 | — | — | |
| SCHEMBL353546 | 0.84 | — | — | |
| SCHEMBL29170909 | 0.75 | — | — | |
| SCHEMBL3195340 | 0.74 | — | — | |
| SCHEMBL3205178 | 0.74 | — | — | |
| SCHEMBL3211366 | 0.72 | — | — | |
| SCHEMBL31243083 | 0.70 | — | — | |
| SCHEMBL10291293 | 0.70 | — | — | |
| SCHEMBL11897589 | 0.70 | — | — | |
| SCHEMBL820891 | 0.69 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 147 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-100349258-C | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) | 2007-11-14 | — | — | CN | claimed |
| US-7132224-B2 | Amplificated photoresist; acid generator which generated acid when exposure to radiation and lactone; immersion in solution of perfluoropolyether | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2006-11-07 | — | — | US | claimed |
| CN-1574220-A | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) | 2005-02-02 | — | — | CN | claimed |
| US-20040253548-A1 | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. | 2004-12-16 | — | — | US | claimed |
| US-20250286137-A1 | SECONDARY BATTERY AND ELECTRONIC APPARATUS | NINGDE AMPEREX TECHNOLOGY LIMITED (CN) | 2025-09-11 | — | — | US | disclosed |
| EP-4614655-A1 | SECONDARY BATTERY AND ELECTRONIC APPARATUS | Ningde Amperex Technology Limited (CN) | 2025-09-10 | — | — | EP | disclosed |
| CN-119095900-A | Functionalized polybenzimidazole polymers for ionomer and proton exchange membrane applications | 1S1能源有限公司 | 2024-12-06 | — | — | CN | disclosed |
| CN-118530432-A | Polyurea composite thickening agent, polyurea composite lubricating grease and preparation method of polyurea composite thickening agent and polyurea composite lubricating grease | 西安石油大学 | 2024-08-23 | — | — | CN | disclosed |
| EP-4391139-A1 | ELECTROLYTE SOLUTION, ELECTROCHEMICAL DEVICE, SECONDARY BATTERY, AND LITHIUM ION SECONDARY BATTERY | DAIKIN INDUSTRIES, LTD. (JP) | 2024-06-26 | — | — | EP | disclosed |
| US-12015121-B2 | Electrolyte, electrochemical device, lithium ion secondary battery, and module | DAIKIN INDUSTRIES, LTD. (JP) | 2024-06-18 | — | — | US | disclosed |
| US-12002926-B2 | Electrolyte, electrochemical device, lithium ion secondary battery, and module | DAIKIN INDUSTRIES, LTD. (JP) | 2024-06-04 | — | — | US | disclosed |
| US-11996522-B2 | Electrolyte, electrochemical device, lithium-ion secondary battery, and module | DAIKIN INDUSTRIES, LTD. (JP) | 2024-05-28 | — | — | US | disclosed |
| EP-2333885-A1 | LITHIUM BATTERY | Panasonic Corporation (JP) | 2011-06-15 | — | — | EP | disclosed |
| CN-101427416-B | Nonaqueous electrolyte battery, battery pack and vehicle | TOKYO SHIBAURA ELECTRIC CO | 2011-05-11 | — | — | CN | disclosed |
| CN-101427416-A | Nonaqueous electrolyte battery, battery pack and vehicle | TOSHIBA KK (JP) | 2009-05-06 | — | — | CN | disclosed |
| US-20080280201-A1 | NEGATIVE ELECTRODE FOR USE WITH SECONDARY BATTERY AND SECONDARY BATTERY USING SUCH NEGATIVE ELECTRODE | MURATA MANUFACTURING CO., LTD. (JP) | 2008-11-13 | — | — | US | disclosed |
| CN-100349258-C | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) | 2007-11-14 | — | — | CN | disclosed |
| US-7132224-B2 | Amplificated photoresist; acid generator which generated acid when exposure to radiation and lactone; immersion in solution of perfluoropolyether | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 2006-11-07 | — | — | US | disclosed |
| CN-1574220-A | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) | 2005-02-02 | — | — | CN | disclosed |
| US-20040253548-A1 | Pattern formation method | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. | 2004-12-16 | — | — | US | disclosed |