SCHEMBL1936435

SCHEMBL1936435

CC=CC(=O)O[Si](OCC)(OCC)OCC

nearest known ligand 0.33

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
HCAR2 Q8TDS4 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28385988 0.89 HCAR2 (0.41) HCAR2
SCHEMBL27730778 0.82 HCAR2 (0.32) HCAR2
SCHEMBL28263552 0.80 HCAR2 (0.31) HCAR2
SCHEMBL8927252 0.78 HCAR2 (0.44) HCAR2
SCHEMBL21291625 0.77 ATM (0.41) HCAR2
SCHEMBL5996774 0.77
SCHEMBL5227421 0.77 TSHR (0.41) HCAR2
SCHEMBL28123273 0.76 HCAR2 (0.55) HCAR2
SCHEMBL259944 0.76 HCAR2 (0.36) HCAR2
SCHEMBL28316592 0.75 TSHR (0.39)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 53 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114402467-A Hybrid functionalized fluoropolymers for lithium ion batteries 阿科玛股份有限公司 2022-04-26 CN claimed
CN-114026168-A Hybrid functionalized fluoropolymers 阿科玛股份有限公司 2022-02-08 CN claimed
US-20140336304-A1 Durable dental material with improved transparent properties HERAEUS KULZER GMBH (DE) 2014-11-13 US claimed
JP-54133585-A None JP disclosed
CN-118318191-A Composition for forming wavelength conversion film 日产化学株式会社 2024-07-09 CN disclosed
CN-118192168-A Photosensitive resin composition 日产化学株式会社 2024-06-14 CN disclosed
CN-110537146-B Photosensitive resin composition 日产化学株式会社 2024-03-15 CN disclosed
CN-110537147-B Photosensitive resin composition 日产化学株式会社 2024-03-12 CN disclosed
CN-110573963-B Photosensitive resin composition 日产化学株式会社 2023-10-24 CN disclosed
CN-116848466-A Positive photosensitive resin composition 日产化学株式会社 2023-10-03 CN disclosed
CN-116622010-A Composite carrier type olefin polymerization catalyst and preparation method and application thereof 广东石油化工学院 2023-08-22 CN disclosed
US-20040247875-A1 Oraganic electroluminescene element-use transparent substrate and element NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2004-12-09 US disclosed
EP-1435761-A1 ORGANIC ELECTROLUMINESCENCE ELEMENT−USE TRANSPARENT SUBSTRATE AND ELEMENT Nissan Chemical Industries, Ltd. (JP) 2004-07-07 EP disclosed
EP-1026202-B1 AQUEOUS RESIN DISPERSION COMPOSITION DAIKIN IND LTD (JP) 2004-04-07 EP disclosed
US-6541552-B1 Polysilicates for paints having high gloss, stain-proofing, weather resistance, and storage stability DAIKIN INDUSTRIES, LTD. (JP) 2003-04-01 US disclosed
US-6359030-B1 FOR FILM, COATING FILM BEING EXCELLENT IN CHEMICAL RESISTANCE, WATER RESISTANCE, MECHANICAL PROPERTIES DAIKIN INDUSTRIES, LTD. (JP) 2002-03-19 US disclosed
EP-1035184-A1 WATER-BASE SYNTHETIC RESIN DISPERSION COMPOSITION Daikin Industries, Ltd. (JP) 2000-09-13 EP disclosed
EP-1026202-A1 AQUEOUS RESIN DISPERSION COMPOSITION Daikin Industries, Ltd. (JP) 2000-08-09 EP disclosed
JP-S54133585-A PHOTO-SETTING ADHESIVE COMPOSITION HAVING EXCELLENT RESISTANCE TO PLATING HITACHI LTD 1979-10-17 JP disclosed
US-4042613-A PHOTOSENSITIZERS, POLYMERS DAI NIPPON PRINTING CO., LTD. (JA) 1977-08-16 US disclosed