SCHEMBL193902

SCHEMBL193902

CCC1CCCCN1O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7614934 0.93
Choline SCHEMBL2085789 0.84 KMT2A (0.39)
SCHEMBL3425018 0.79 S1PR1 (0.44)
SCHEMBL16765733 0.78
SCHEMBL2850062 0.77 S1PR1 (0.50)
SCHEMBL27685420 0.76 S1PR1 (0.52)
SCHEMBL3425965 0.76 S1PR1 (0.52)
SCHEMBL3425956 0.76 S1PR1 (0.52)
SCHEMBL3426408 0.76 S1PR1 (0.52)
SCHEMBL3425650 0.76 S1PR1 (0.52)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3176199-A1 ANHYDRIDE ACCELERATORS FOR EPOXY RESIN SYSTEMS AIR PRODUCTS AND CHEMICALS, INC. (US) 2017-06-07 EP claimed
EP-3559077-B1 N-HYDROXYL ETHYL PIPERIDINE (NHEP): A NOVEL CURING AGENT FOR EPOXY SYSTEMS EVONIK OPERATIONS GMBH (DE) 2023-12-06 EP disclosed
CN-113072524-B Polyfluoroaryl substituted alkane and preparation method thereof 贵州民族大学 2022-11-01 CN disclosed
CN-113072524-A Polyfluoroaryl substituted alkane and preparation method thereof 贵州民族大学 2021-07-06 CN disclosed
US-10738147-B2 N-hydroxyl ethyl piperidine (NHEP): a novel curing agent for epoxy systems EVONIK OPERATIONS GMBH (DE) 2020-08-11 US disclosed
US-9155759-B2 Heterochain aliphatic poly-N-oxide copolymers and vaccinating agents and drugs based thereon OBCHTCHESTVO S OGRANITCHENNOI OTVESTVENNOSTYOU “NPO PETROVAKS FARM” (RU) 2015-10-13 US disclosed
EP-1158363-B1 Positive resist composition and onium salts of saccharin derivatives FUJIFILM CORP (JP) 2014-01-22 EP disclosed
EP-2400994-A1 AIR CLEANING APPARATUS Steiner, John William (AU) 2012-01-04 EP disclosed
WO-2010096866-A1 AIR CLEANING APPARATUS STEINER JOHN WILLIAM (AU) 2010-09-02 WO disclosed
US-6605409-B2 Includes a compound that generates a specific sulfonimide compound by irradiation with an actinic ray or a radiation and (B) a resin having an acid decomposable group which increases solubility in an alkali developer; improved resolving power FUJI PHOTO FILM CO., LTD. (JP) 2003-08-12 US disclosed
WO-2002077712-A2 PHOTORESIST COMPOSITION SHIPLEY COMPANY, L.L.C. (US) 2002-10-03 WO disclosed
US-20020006578-A1 Positive resist composition FUJI PHOTO FILM CO., LTD. 2002-01-17 US disclosed
EP-1158363-A1 Positive resist composition and onium salts of saccharin derivatives FUJI PHOTO FILM CO., LTD. (JP) 2001-11-28 EP disclosed
EP-1086150-A1 POLYMER PRODUCTS AND THEIR USES IN OIL BP Chemicals Limited (GB) 2001-03-28 EP disclosed
WO-1999058580-A1 POLYMER PRODUCTS AND THEIR USES IN OIL BP CHEMICALS LIMITED (GB) 1999-11-18 WO disclosed
WO-1999057162-A1 POLYMERS AND THEIR USES BP CHEMICALS LIMITED (GB) 1999-11-11 WO disclosed
EP-0748343-B1 MAR AND SCUFF RESISTANT POLYURETHANE COMPOSITION REICHHOLD CHEMICALS INC (US) 1998-10-14 EP disclosed
EP-0748343-A1 MAR AND SCUFF RESISTANT POLYURETHANE COMPOSITION REICHHOLD CHEMICALS, INC. (US) 1996-12-18 EP disclosed
WO-1995023818-A1 MAR AND SCUFF RESISTANT POLYURETHANE COMPOSITION REICHHOLD CHEMICALS, INC. (US) 1995-09-08 WO disclosed
US-4147679-A CHAIN EXTENDING ISOCYANATE AND ANIONIC SALT CONTAINING POLYMER PPG INDUSTRIES, INC. (US) 1979-04-03 US disclosed