SCHEMBL193902

SCHEMBL193902

CCC1CCCCN1O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7614934 0.93 — —
Choline SCHEMBL2085789 0.84 KMT2A (0.39) —
SCHEMBL3425018 0.79 S1PR1 (0.44) —
SCHEMBL16765733 0.78 — —
SCHEMBL2850062 0.77 S1PR1 (0.50) —
SCHEMBL3426408 0.76 S1PR1 (0.52) —
SCHEMBL27685420 0.76 S1PR1 (0.52) —
SCHEMBL3425956 0.76 S1PR1 (0.52) —
SCHEMBL3425965 0.76 S1PR1 (0.52) —
SCHEMBL3425650 0.76 S1PR1 (0.52) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3176199-A1 ANHYDRIDE ACCELERATORS FOR EPOXY RESIN SYSTEMS AIR PRODUCTS AND CHEMICALS, INC. (US) 2017-06-07 — — EP claimed
EP-3559077-B1 N-HYDROXYL ETHYL PIPERIDINE (NHEP): A NOVEL CURING AGENT FOR EPOXY SYSTEMS EVONIK OPERATIONS GMBH (DE) 2023-12-06 — — EP disclosed
CN-113072524-B Polyfluoroaryl substituted alkane and preparation method thereof 贵州民族大学 2022-11-01 — — CN disclosed
CN-113072524-A Polyfluoroaryl substituted alkane and preparation method thereof 贵州民族大学 2021-07-06 — — CN disclosed
US-10738147-B2 N-hydroxyl ethyl piperidine (NHEP): a novel curing agent for epoxy systems EVONIK OPERATIONS GMBH (DE) 2020-08-11 — — US disclosed
US-9155759-B2 Heterochain aliphatic poly-N-oxide copolymers and vaccinating agents and drugs based thereon OBCHTCHESTVO S OGRANITCHENNOI OTVESTVENNOSTYOU “NPO PETROVAKS FARM” (RU) 2015-10-13 — — US disclosed
EP-1158363-B1 Positive resist composition and onium salts of saccharin derivatives FUJIFILM CORP (JP) 2014-01-22 — — EP disclosed
EP-2400994-A1 AIR CLEANING APPARATUS Steiner, John William (AU) 2012-01-04 — — EP disclosed
WO-2010096866-A1 AIR CLEANING APPARATUS STEINER JOHN WILLIAM (AU) 2010-09-02 — — WO disclosed
US-6605409-B2 Includes a compound that generates a specific sulfonimide compound by irradiation with an actinic ray or a radiation and (B) a resin having an acid decomposable group which increases solubility in an alkali developer; improved resolving power FUJI PHOTO FILM CO., LTD. (JP) 2003-08-12 — — US disclosed
WO-2002077712-A2 PHOTORESIST COMPOSITION SHIPLEY COMPANY, L.L.C. (US) 2002-10-03 — — WO disclosed
US-20020006578-A1 Positive resist composition FUJI PHOTO FILM CO., LTD. 2002-01-17 — — US disclosed
EP-1158363-A1 Positive resist composition and onium salts of saccharin derivatives FUJI PHOTO FILM CO., LTD. (JP) 2001-11-28 — — EP disclosed
EP-1086150-A1 POLYMER PRODUCTS AND THEIR USES IN OIL BP Chemicals Limited (GB) 2001-03-28 — — EP disclosed
WO-1999058580-A1 POLYMER PRODUCTS AND THEIR USES IN OIL BP CHEMICALS LIMITED (GB) 1999-11-18 — — WO disclosed
WO-1999057162-A1 POLYMERS AND THEIR USES BP CHEMICALS LIMITED (GB) 1999-11-11 — — WO disclosed
EP-0748343-B1 MAR AND SCUFF RESISTANT POLYURETHANE COMPOSITION REICHHOLD CHEMICALS INC (US) 1998-10-14 — — EP disclosed
EP-0748343-A1 MAR AND SCUFF RESISTANT POLYURETHANE COMPOSITION REICHHOLD CHEMICALS, INC. (US) 1996-12-18 — — EP disclosed
WO-1995023818-A1 MAR AND SCUFF RESISTANT POLYURETHANE COMPOSITION REICHHOLD CHEMICALS, INC. (US) 1995-09-08 — — WO disclosed
US-4147679-A CHAIN EXTENDING ISOCYANATE AND ANIONIC SALT CONTAINING POLYMER PPG INDUSTRIES, INC. (US) 1979-04-03 — — US disclosed
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