Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.95 |
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.72 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.72 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.71 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.48 |
| ▸ | MEN1 | O00255 | 1/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.40 |
| ▸ | TP53 | P04637 | 2/20 | 0.38 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.38 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.34 |
| ▸ | SPHK2 | Q9NRA0 | 3/20 | 0.33 |
| ▸ | SPHK1 | Q9NYA1 | 3/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19410598 | 1.00 | TSHR (0.95) | TSHRALDH1A1TDP1SMN1; SMN2MAPK1 | |
| SCHEMBL19410610 | 1.00 | TSHR (0.95) | TSHRALDH1A1TDP1SMN1; SMN2MAPK1 | |
| SCHEMBL19410553 | 1.00 | TSHR (0.95) | TSHRALDH1A1TDP1SMN1; SMN2MAPK1 | |
| SCHEMBL19410602 | 1.00 | TSHR (0.95) | TSHRALDH1A1TDP1SMN1; SMN2MAPK1 | |
| SCHEMBL19410576 | 1.00 | TSHR (0.95) | TSHRALDH1A1TDP1SMN1; SMN2MAPK1 | |
| SCHEMBL1351605 | 1.00 | TSHR (0.95) | TSHRALDH1A1TDP1SMN1; SMN2MAPK1 | |
| SCHEMBL19410551 | 1.00 | TSHR (0.95) | TSHRALDH1A1TDP1SMN1; SMN2MAPK1 | |
| SCHEMBL13974192 | 0.97 | TSHR (1.00) | TSHRALDH1A1TDP1SMN1; SMN2MAPK1 | |
| SCHEMBL17549553 | 0.97 | TSHR (1.00) | TSHRALDH1A1TDP1SMN1; SMN2MAPK1 | |
| SCHEMBL17549551 | 0.97 | TSHR (1.00) | TSHRALDH1A1TDP1SMN1; SMN2MAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107077067-B | Photosensitive resin composition, photosensitive resin laminate, method for producing resin pattern, cured film, and display device | 旭化成株式会社 | 2021-04-13 | — | — | CN | disclosed |
| US-10338468-B2 | Photosensitive resin composition, photosensitive resin laminate, resin pattern production method, cured film, and display device | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2019-07-02 | — | — | US | disclosed |
| US-20170285474-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN LAMINATE, RESIN PATTERN PRODUCTION METHOD, CURED FILM, AND DISPLAY DEVICE | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2017-10-05 | — | — | US | disclosed |