Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.40 |
| ▸ | MAPT | P10636 | 4/20 | 0.40 |
| ▸ | HPGD | P15428 | 3/20 | 0.40 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.40 |
| ▸ | ALOX15 | P16050 | 3/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.40 |
| ▸ | USP2 | O75604 | 2/20 | 0.40 |
| ▸ | TP53 | P04637 | 2/20 | 0.40 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.40 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.40 |
| ▸ | LMNA | P02545 | 2/20 | 0.40 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.40 |
| ▸ | MEN1 | O00255 | 1/20 | 0.40 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.36 |
| ▸ | THRB | P10828 | 1/20 | 0.36 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.34 |
| ▸ | CASR | P41180 | 1/20 | 0.34 |
| ▸ | TSHR | P16473 | 2/20 | 0.33 |
| ▸ | DPP4 | P27487 | 2/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16308021 | 1.00 | KDM4E (0.40) | KDM4EMAPTHPGDCYP3A4ALOX15 | |
| SCHEMBL27744780 | 0.84 | KDM4E (0.36) | KDM4EMAPTHPGDCYP3A4ALOX15 | |
| SCHEMBL28428168 | 0.83 | MAPT (0.38) | KDM4EMAPTHPGDCYP3A4ALOX15 | |
| SCHEMBL3802806 | 0.81 | CYP2C19 (0.36) | KDM4EMAPTHPGDCYP3A4ALOX15 | |
| SCHEMBL252297 | 0.81 | CYP3A4 (0.37) | KDM4EMAPTHPGDCYP3A4ALOX15 | |
| SCHEMBL2488648 | 0.81 | CYP2C19 (0.36) | KDM4EMAPTHPGDCYP3A4ALOX15 | |
| SCHEMBL2512150 | 0.80 | SRD5A2 (0.48) | HPGDALDH1A1KMT2ALMNAMEN1 | |
| SCHEMBL25553550 | 0.80 | CHRNA7 (0.37) | MAPTALDH1A1TDP1KMT2AMEN1 | |
| SCHEMBL5598796 | 0.79 | ESR1 (0.33) | KDM4EMAPTHPGDCYP3A4ALOX15 | |
| SCHEMBL22394297 | 0.79 | KMT2A (0.39) | ALDH1A1KMT2ALMNAEPHX1THRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1792 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-104423149-B | Photosensitive resin composition and the colour filter for using it | 三星SDI株式会社 | 2019-10-15 | — | — | CN | claimed |
| CN-104570604-B | Photosensitive resin composition and the light blocking layer for using it | 第毛织株式会社 | 2019-01-25 | — | — | CN | claimed |
| US-10042087-B2 | Photosensitive resin composition and color filter using the same | SAMSUNG SDI CO., LTD. (KR) | 2018-08-07 | — | — | US | claimed |
| CN-106502051-A | Negative light-sensitive resin combination and the photo-curable pattern formed by which | 东友精细化工有限公司 | 2017-03-15 | — | — | CN | claimed |
| CN-102540716-B | The color filter of photosensitive resin composition and use said composition | CHEIL INDUSTRIES INC. (KR) | 2016-03-23 | — | — | CN | claimed |
| US-9164385-B2 | Photosensitive resin composition and light blocking layer using the same | CHEIL INDUSTRIES INC. (KR) | 2015-10-20 | — | — | US | claimed |
| CN-104570604-A | Photosensitive Resin Composition and Light Blocking Layer Using the Same | CHEIL IND INC | 2015-04-29 | — | — | CN | claimed |
| US-20150111156-A1 | Photosensitive Resin Composition and Light Blocking Layer Using the Same | CHEIL INDUSTRIES INC. (KR) | 2015-04-23 | — | — | US | claimed |
| CN-104423149-A | Photosensitive Resin Composition and Color Filter Using the Same | SAMSUNG SDI CO LTD | 2015-03-18 | — | — | CN | claimed |
| US-20150069310-A1 | Photosensitive Resin Composition and Color Filter Using the Same | SAMSUNG SDI CO., LTD. (KR) | 2015-03-12 | — | — | US | claimed |
| CN-102445842-A | Photosensitive resin composition and light-blocking layer using the same | CHEIL IND INC | 2012-05-09 | — | — | CN | claimed |
| US-20120091407-A1 | Photosensitive Resin Composition and Light Blocking Layer Using the Same | CHEIL INDUSTRIES INC. (KR) | 2012-04-19 | — | — | US | claimed |
| CN-102344525-A | Alkali-soluble resin polymer and negative-type photosensitive resin composition comprising same | LG CHEMICAL LTD | 2012-02-08 | — | — | CN | claimed |
| CN-101109900-B | Photosensitive resin composition for color filter of image sensor and color filter of image sensor using the same | CHEIL IND INC | 2011-03-09 | — | — | CN | claimed |
| US-20080020300-A1 | Photosensitive Resin Composition for Color Filter of Image Sensor and Color Filter of Image Sensor Using the Same | CHEIL INDUSTRIES INC. | 2008-01-24 | — | — | US | claimed |
| CN-101109900-A | Photosensitive resin composition for color filter of image sensor and color filter of image sensor using the same | CHEIL IND INC (KR) | 2008-01-23 | — | — | CN | claimed |
| EP-1280882-A1 | HIGHLY CONCENTRATED FABRIC SOFTENER COMPOSITIONS AND ARTICLES CONTAINING SUCH COMPOSITIONS | THE PROCTER & GAMBLE COMPANY (US) | 2003-02-05 | — | — | EP | claimed |
| WO-2001085892-A1 | HIGHLY CONCENTRATED FABRIC SOFTENER COMPOSITIONS AND ARTICLES CONTAINING SUCH COMPOSITIONS | THE PROCTER & GAMBLE COMPANY (US) | 2001-11-15 | — | — | WO | claimed |
| US-5445747-A | Containing fabric softener, perfume selected to cover odors | THE PROCTER & GAMBLE COMPANY (US) | 1995-08-29 | — | — | US | claimed |
| US-4138411-A | RUTHENIUM OR OSMIUM CATALYST | RHONE-POULENC S. A. (FR) | 1979-02-06 | — | — | US | claimed |