⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ammonia Solution, Strong SCHEMBL734600 | 0.81 | — | — | |
| SCHEMBL9233484 | 0.80 | — | — | |
| SCHEMBL1109664 | 0.79 | — | — | |
| SCHEMBL56081 | 0.79 | — | — | |
| SCHEMBL5604072 | 0.78 | MME (0.33) | — | |
| SCHEMBL448123 | 0.77 | — | — | |
| SCHEMBL7093179 | 0.77 | — | — | |
| SCHEMBL28904648 | 0.76 | — | — | |
| SCHEMBL28947393 | 0.76 | — | — | |
| SCHEMBL28710274 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250326934-A1 | DERIVATIZATION PROCESS FOR PRODUCING CATIONIC COLLOIDAL SILICA | NOURYON CHEMICALS INTERNATIONAL B.V. (NL) | 2025-10-23 | — | — | US | disclosed |
| CN-109593473-B | Aqueous low abrasive silica slurry and amine carboxylic acid compositions for shallow trench isolation and methods of making and using the same | 罗门哈斯电子材料CMP控股股份有限公司 | 2021-04-27 | — | — | CN | disclosed |
| CN-108687649-B | Slurry containing cationic particles and method for CMP of spin-on carbon film using the same | 罗门哈斯电子材料CMP控股股份有限公司 | 2020-08-14 | — | — | CN | disclosed |
| CN-107964373-B | Aqueous composition of stabilized silica particles containing aminosilane groups | 罗门哈斯电子材料CMP控股股份有限公司 | 2020-07-28 | — | — | CN | disclosed |
| US-20190185713-A1 | CMP SLURRY COMPOSITIONS CONTAINING SILICA WITH TRIMETHYLSULFOXONIUM CATIONS | ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. | 2019-06-20 | — | — | US | disclosed |
| US-20190092970-A1 | AQUEOUS LOW ABRASIVE SILICA SLURRY AND AMINE CARBOXYLIC ACID COMPOSITIONS FOR USE IN SHALLOW TRENCH ISOLATION AND METHODS OF MAKING AND USING THEM | ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. | 2019-03-28 | — | — | US | disclosed |
| US-10119048-B1 | Low-abrasive CMP slurry compositions with tunable selectivity | ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. (US) | 2018-11-06 | — | — | US | disclosed |
| US-10037889-B1 | Cationic particle containing slurries and methods of using them for CMP of spin-on carbon films | ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. (US) | 2018-07-31 | — | — | US | disclosed |
| US-9803108-B1 | Aqueous compositions of stabilized aminosilane group containing silica particles | ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. (US) | 2017-10-31 | — | — | US | disclosed |
| US-9783702-B1 | Aqueous compositions of low abrasive silica particles | ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS INC. (US) | 2017-10-10 | — | — | US | disclosed |