SCHEMBL195061

SCHEMBL195061

CC(CO)CC(C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12024890 1.00
SCHEMBL12024883 1.00
SCHEMBL10632022 0.92 TSHR (0.40)
Formic Acid SCHEMBL1683957 0.87 TSHR (0.33)
SCHEMBL13559118 0.86 TSHR (0.36)
SCHEMBL1516581 0.86 TSHR (0.48)
SCHEMBL134615 0.83 TSHR (0.36)
SCHEMBL18251429 0.80
SCHEMBL8532937 0.79
SCHEMBL3226244 0.78 TSHR (0.32)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 806 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106544505-B A kind of extractant composition and the preparation method and application thereof 金发科技股份有限公司 2018-10-26 CN claimed
CN-106544506-B A kind of extractant composition and the preparation method and application thereof 金发科技股份有限公司 2018-10-26 CN claimed
CN-106544505-A A kind of extractant composition and preparation method and application 金发科技股份有限公司 2017-03-29 CN claimed
CN-106544506-A A kind of extractant composition and preparation method and application 金发科技股份有限公司 2017-03-29 CN claimed
US-8895226-B2 Coating composition for DUV filtering, method of forming photoresist pattern using the same and method of fabricating semiconductor device by using the method SAMSUNG ELECTRONICS CO., LTD. (KR) 2014-11-25 US claimed
US-20140205950-A1 COATING COMPOSITION FOR DUV FILTERING, METHOD OF FORMING PHOTORESIST PATTERN USING THE SAME AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE BY USING THE METHOD SAMSUNG ELECTRONICS CO., LTD. (KR) 2014-07-24 US claimed
US-20120021355-A1 COATING COMPOSITION FOR DUV FILTERING, METHOD OF FORMING PHOTORESIST PATTERN USING THE SAME AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE BY USING THE METHOD SAMSUNG ELECTRONICS CO., LTD. (KR) 2012-01-26 US claimed
US-20110237685-A1 PHOTOLABILE FRAGRANCE STORAGE SUBSTANCES HENKEL AG & CO. KGAA (DE) 2011-09-29 US claimed
US-6989052-B1 Phase change ink printing process XEROX CORPORATION (US) 2006-01-24 US claimed
US-20060004123-A1 PHASE CHANGE INK PRINTING PROCESS XEROX CORPORATION 2006-01-05 US claimed
US-6909010-B2 Facile synthesis of symmetric esters of alkylenebisphosphonic acids LOYOLA UNIVERSITY OF CHICAGO (US) 2005-06-21 US claimed
EP-1268380-B1 METHOD FOR PRODUCING ALKENYL ETHERS BASF AG (DE) 2003-09-17 EP claimed
US-20030114715-A1 Method for producing alkenyl ethers BOETTCHER ARND (DE) 2003-06-19 US claimed
US-20030060648-A1 Facile synthesis of symmetric esters of alkylenebisphosphonic acids LOYOLA UNIVERSITY OF CHICAGO 2003-03-27 US claimed
WO-2002085918-A1 A FACILE SYNTHESIS OF SYMMETRIC ESTERS OF ALKYLENEBISPHOSPHONIC ACIDS LOYOLA UNIVERSITY OF CHICAGO (US) 2002-10-31 WO claimed
US-5663265-A FREE RADICAL COPOLYMERIZATION FOR COATINGS HOECHST AKTIENGESELLSCHAFT (DE) 1997-09-02 US claimed
US-5596057-A INTERPOLYMER FROM STERICALLY HINDERED UNSATURATED ESTERS HOECHST AKTIENGESELLSCHAFT (DE) 1997-01-21 US claimed
EP-0254588-B1 Imidazo[4,5-b] pyridine compounds, process for preparing same and pharmaceutical compositions containing same TOKYO TANABE COMPANY LIMITED (JP) 1992-01-15 EP claimed
US-4808596-A STORAGE STABLE, ANTIULCER AGENTS TOKYO TANABE COMPANY, LTD. (JP) 1989-02-28 US claimed
EP-0254588-A1 Imidazo[4,5-b] pyridine compounds, process for preparing same and pharmaceutical compositions containing same TOKYO TANABE COMPANY LIMITED (JP) 1988-01-27 EP claimed