Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CPN1 | P15169 | 2/20 | 0.43 |
| ▸ | CPB2 | Q96IY4 | 2/20 | 0.43 |
| ▸ | SLC6A1 | P30531 | 2/20 | 0.36 |
| ▸ | SLC6A11 | P48066 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 1/20 | 0.36 |
| ▸ | LMNA | P02545 | 1/20 | 0.36 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.36 |
| ▸ | SLC6A13 | Q9NSD5 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.35 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.35 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
| ▸ | ATM | Q13315 | 1/20 | 0.35 |
| ▸ | NOS2 | P35228 | 1/20 | 0.35 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.35 |
| ▸ | APLNR | P35414 | 2/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29333023 | 1.00 | CPN1 (0.43) | CPN1CPB2SLC6A1SLC6A11TSHR | |
| SCHEMBL7128001 | 0.88 | CPN1 (0.43) | CPN1CPB2SLC6A1SLC6A11TSHR | |
| SCHEMBL28364127 | 0.87 | SLC6A2 (0.32) | CPN1CPB2 | |
| SCHEMBL13400108 | 0.83 | — | — | |
| SCHEMBL31326614 | 0.83 | — | — | |
| SCHEMBL1570140 | 0.83 | — | — | |
| SCHEMBL5509022 | 0.83 | — | — | |
| SCHEMBL8137016 | 0.83 | — | — | |
| SCHEMBL31326604 | 0.83 | — | — | |
| SCHEMBL13400319 | 0.83 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 63 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115677994-B | Preparation and application of polyester and nano silver conductive film based on biphenyl dicarboxylic acid | 武汉科技大学 | 2024-09-17 | — | — | CN | claimed |
| CN-115677994-A | Preparation and application of polyester and nano-silver conductive film based on biphenyldicarboxylic acid | 武汉科技大学 | 2023-02-03 | — | — | CN | claimed |
| CN-115677994-B | Preparation and application of polyester and nano silver conductive film based on biphenyl dicarboxylic acid | 武汉科技大学 | 2024-09-17 | — | — | CN | disclosed |
| CN-115677994-B | Preparation and application of polyester and nano silver conductive film based on biphenyl dicarboxylic acid | 武汉科技大学 | 2024-09-17 | — | — | CN | disclosed |
| CN-115044040-B | Polyimide-containing polymer, positive photosensitive resin composition, negative photosensitive resin composition, and pattern forming method | 信越化学工业株式会社 | 2024-07-02 | — | — | CN | disclosed |
| CN-113527101-B | Novel compound, polymer, process for producing the same, photosensitive resin composition, pattern forming process, cured film, and electronic component | 信越化学工业株式会社 | 2024-04-23 | — | — | CN | disclosed |
| CN-111381447-B | Photosensitive resin composition, laminate, and pattern forming method | 信越化学工业株式会社 | 2024-03-08 | — | — | CN | disclosed |
| CN-117501180-A | Laminate, method for producing laminate, and method for forming pattern | 信越化学工业株式会社 | 2024-02-02 | — | — | CN | disclosed |
| CN-113527680-B | Polymer, photosensitive resin composition, pattern forming method, cured film, and electronic component | 信越化学工业株式会社 | 2023-04-28 | — | — | CN | disclosed |
| CN-108107676-B | Chemically amplified positive resist film laminate and pattern formation method | 信越化学工业株式会社 | 2023-02-21 | — | — | CN | disclosed |
| CN-115677994-A | Preparation and application of polyester and nano-silver conductive film based on biphenyldicarboxylic acid | 武汉科技大学 | 2023-02-03 | — | — | CN | disclosed |
| CN-103620499-B | Positive resist composition | 中央硝子株式会社 | 2016-08-17 | — | — | CN | disclosed |
| CN-103620499-A | positive resist composition | CENTRAL GLASS CO LTD | 2014-03-05 | — | — | CN | disclosed |
| CN-103619892-A | Phenolic resin and underlayer film forming material for lithography | MITSUBISHI GAS CHEMICAL CO | 2014-03-05 | — | — | CN | disclosed |
| CN-102089709-B | Radiation-sensitive resin composition | JSR CORP | 2013-10-30 | — | — | CN | disclosed |
| CN-102150082-B | Radiation-sensitive resin composition | JSR CORP | 2013-08-07 | — | — | CN | disclosed |
| CN-101477307-B | Photomask blank, resist pattern forming process, and photomask preparation process | SHIN ETSU EHEMICAL CO LTD | 2012-12-12 | — | — | CN | disclosed |
| CN-102150082-A | Radiation-sensitive resin composition | JSR CORP | 2011-08-10 | — | — | CN | disclosed |
| CN-102089709-A | Radiation-sensitive resin composition | JSR CORP | 2011-06-08 | — | — | CN | disclosed |
| CN-102041022-A | Production of hydrocarbons | SASOL TECH PTY LTD | 2011-05-04 | — | — | CN | disclosed |